机译:等离子体辅助脉冲激光沉积在各种衬底上高温生长InN
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
Department of Lasers, National Institute for Lasers, Plasma, and Radiation Physics (N1LPRP), Str. Atomistilor nr. 409, 077125 Magurele, Romania;
pulsed laser deposition; ill-nitrides; thin films;
机译:等离子体辅助脉冲激光沉积氧化镓氧化镓氧化镓的生长特性
机译:使用HfN缓冲层通过脉冲激光沉积在MgO衬底上外延生长高纯度立方InN薄膜
机译:通过脉冲激光沉积在尖晶石衬底上生长InN膜
机译:通过等离子体辅助脉冲激光沉积在Si衬底上生长的氮化铝薄膜
机译:通过脉冲激光沉积和化学气相沉积合成新型材料:第一部分:氮化碳薄膜的能量沉积和稳定性。第二部分:一维材料和装置的催化生长。
机译:在不同温度下通过脉冲激光沉积在AlN / Si异质结构上外延生长的GaN薄膜的微观结构和生长机理
机译:衬底温度和环境氧压对脉冲激光沉积Ba(Fe1 / 2Nb1 / 2)O3薄膜生长的影响
机译:通过微波等离子体辅助化学气相沉积在高温下高生长率同质外延金刚石膜沉积