机译:逆脉冲激光沉积的均质膜
Institute of Medical Physics and Informatics, University of Szeged, Koranyifasor 9., H-6720 Szeged, Hungary,Department of Optics and Quantum Electronics, University of Szeged, PO Box 406, H-6701 Szeged, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, PO Box 406, H-6701 Szeged, Hungary;
Department of Natural Sciences and Environmental Protection, College of Dunaujvaros, PO Box 152, H-2401 Dunaujvaros, Hungary,LaserSkill Ltd., Kalvaria sgt. 24., H-6722 Szeged, Hungary;
Institute of Medical Physics and Informatics, University of Szeged, Koranyifasor 9., H-6720 Szeged, Hungary;
pulsed laser deposition; large area; thickness homogenization; thickness inhomogeneity index (tll);
机译:脉冲激光沉积抗尖晶石Nico_2O_4外延薄膜磁性特性对脉冲激光沉积的影响
机译:脉冲激光沉积在Cu(111)衬底上合成均质和高质量GaN膜
机译:脉冲激光沉积生长异质外延β-Ga_2O_3薄膜上Cu肖特基接触的均值和均匀势垒高度的确定
机译:逆脉冲激光沉积使薄膜均质化
机译:通过脉冲激光沉积和化学气相沉积合成新型材料:第一部分:氮化碳薄膜的能量沉积和稳定性。第二部分:一维材料和装置的催化生长。
机译:在钠钙玻璃基板上通过脉冲激光沉积生长的ZnO膜,用于表皮葡萄球菌生物膜的紫外线灭活
机译:脉冲激光沉积生长杂交β-GA2O3薄膜Cu Schottky触点的平均值和均相阻挡高度
机译:用于激光器和准相位匹配器件的薄膜脉冲激光沉积。