机译:使用N_2稀释的二乙基锌和H_2O_2前体在热SiO_2和Si表面上沉积ZnO的原子层
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China;
The Key Laboratory of Specialty Fiber Optics and Optical Access Networks, Shanghai University, Shanghai 200072, China;
ZnO; nanodots; nano-crystalline film; atomic layer deposition (ALD);
机译:二乙基锌和水前驱体原子层沉积生长的低温Zno膜的结构和光学性质
机译:二乙基锌前驱体原子层沉积对ZnO的低温生长
机译:使用商业化的硅前驱体进行SiO_2的热和等离子体增强原子层沉积
机译:用二乙基锌前驱体和硫化氢在p型GaSb(100)上沉积和表征原子层沉积ZnS薄膜
机译:铜前体在金属表面上用于原子层沉积(ALD)的表面反应性。
机译:用原子层沉积共同给药臭氧和去离子水作为ZnO薄膜生长的氧化剂前体
机译:以硼酸三异丙酯为硼前驱体的B掺杂ZnO的原子层沉积以及与Al掺杂的ZnO的比较
机译:用于下一代显示器的原子层沉积制备的高性能和高可靠性ZnO薄膜晶体管。