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Conductivity modification of ZnO film by low energy Fe~(10+) ion implantation

机译:低能Fe〜(10+)离子注入改性ZnO薄膜的电导率

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In this paper we report the structural, optical and electrical behaviours of ZnO films implanted with 300 keV Fe~(10+) ions. From UV-vis spectroscopy it is observed that the band gap of the films decreases after implantation. Photoluminescence yield seems to increase in the implanted samples. From Hall measurements it is observed that the unimplanted sample shows n-type conductivity for the entire temperature range (100-300 K), whereas after implantation the samples show p-type conductivity for ≤200K. The DC resistivity of the implanted samples is found to be lower than that of the unimplanted sample. We have found that the magnetoresistance of our samples is positive in the temperature range 200-300 K, but it becomes negative below 200 K.
机译:本文报道了注入300keV Fe〜(10+)离子的ZnO薄膜的结构,光学和电学行为。从紫外-可见光谱观察到,膜的带隙在注入后减小。植入样品中的光致发光产率似乎增加。根据霍尔测量,可以观察到未植入的样品在整个温度范围(100-300 K)内显示n型电导率,而在植入后,样品的≤200K则显示p型电导率。发现植入样品的DC电阻率低于未植入样品的DC电阻率。我们发现,样品的磁阻在200-300 K的温度范围内为正,而在200 K以下的范围内为负。

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