机译:各种溅射方法沉积ITO膜对有机层的破坏比较研究
State Key Laboratory for Corrosion and Protection, Division of Surface Engineering of Materials, Institute of Metal Research,Chinese Academy of Sciences, Shenyang 110016, PR China;
College of Mechanical Engineering, Shenyang University, Shenyang 110044, PR China;
Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;
Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;
Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;
Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;
Damage to organic layer; Magnetron sputtering (MS); Low voltage sputtering (LVS); Kinetic-energy-control-deposition (KECD); Facing target sputtering (FTS); PL spectra;
机译:有机发射层上ITO膜的低损伤溅射沉积研究
机译:透明导电Gazo薄膜的低压溅射沉积,以使有机层损坏最小化
机译:射频磁控溅射沉积铝掺杂ZnO薄膜过程中对有机发光层的损伤抑制
机译:电子束沉积,离子镀,离子辅助沉积和双离子束溅射沉积二氧化硅薄膜IR和UV激光损伤电阻的对比研究
机译:半导体表面上有机膜的生长:涉及异氰酸酯和异硫氰酸酯的基础反应性研究和分子层沉积。
机译:沉积技术(电沉积与溅射)对纳米结构Fe70PD30膜性能影响的对比研究
机译:低损伤ITO薄膜对有机发光膜的溅射沉积
机译:离子束溅射沉积高(Tc)超导薄膜的离子散射和溅射工艺研究:沉积参数的优化。