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Optical and microstructural characterisation of Au-Sn and Cu-Sn diffusive layers

机译:Au-Sn和Cu-Sn扩散层的光学和微观结构表征

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Phase composition, crystallinity, optical and electrical properties were determined for Au-Sn and Cu-Sn ultra-thin films produced by sequential evaporating and co-depositing of metals on glass plates in a vacuum. Thickness of Sn films grown on top of Au(Cu) nanolayers (d_(Au(Cu)) - 20 nm) was varied to obtain different atomic concentration ratios of Au(Cu)-rich diffusive samples up to 1:1. The samples were characterised using the XRD, SEM, spectroscopic ellipsometry and transmittance measurements. The XRD patterns indicated creation of AuSn and AuSn_2 intermetallic phases at room temperature in both types of Au-Sn samples, formation of Cu_6Sn_5 compound in bilayer Sn/Cu samples and Cu_(10)Sn_3 intermetallic in the co-deposited Sn-Cu film. There was observed a substantial influence of morphology and phase composition on the effective complex dielectric functions and optical conductivity of the multiphase films, determined using the transmittance and variable angle spectroscopic ellipsometry measurements in the photon energy range of 0.6-6.5 eV. Adopting the Drude-Lorentz parameterisation approach to optical spectra enabled to extract contributions related to the free-carriers, interband transitions and plasmonic effects. The optical resistivity agreed reasonably with the dc-resistivity results, which changed approximately from 17.5μΩ cm to 26 μΩ cm and from 24 μΩ cm to 96 μΩ cm for investigated Au-Sn and Cu-Sn systems, respectively.
机译:确定了通过在真空中在玻璃板上依次蒸发和共沉积金属而制得的Au-Sn和Cu-Sn超薄薄膜的相组成,结晶度,光学和电学性质。改变生长在Au(Cu)纳米层(d_(Au(Cu))-20 nm)顶部的Sn膜的厚度,以获得高达1:1的富含Au(Cu)的扩散样品的不同原子浓度比。使用XRD,SEM,椭圆偏振光谱和透射率测量对样品进行表征。 XRD图谱表明两种类型的Au-Sn样品在室温下均生成AuSn和AuSn_2金属间相,在双层Sn / Cu样品中形成Cu_6Sn_5化合物,并在共沉积Sn-Cu膜中形成Cu_(10)Sn_3金属间相。观察到形态和相组成对多相膜的有效复数介电函数和光导率的重大影响,这是通过在0.6-6.5 eV的光子能量范围内使用透射率和可变角度分光椭圆偏振光测量法确定的。对光谱采用Drude-Lorentz参数化方法,可以提取与自由载波,带间跃迁和等离子体效应有关的贡献。光学电阻率与直流电阻率结果基本吻合,对于研究的Au-Sn和Cu-Sn系统,直流电阻率结果分别从17.5μΩcm变为26μΩcm和从24μΩcm变为96μΩcm。

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