Deposition of Dielectric Optical Coatings: A Microstructural Study of the Deposited Layers and Interfaces

摘要

Thin dielectric films are deposited on substrates for optical applications using a variety of techniques including reactive sputtering, sol-gel reaction, and ion assisted plasma deposition. This transmission electron microscopy study characterizes the microstructures of optical coatings produced by the above deposition techniques and shows how changing deposition conditions changes microstructure and subsequently the optical properties. 5 refs., 7 figs. (ERA citation 14:027697)