机译:激光诱导背面干法刻蚀技术在SERS衬底表面制造中的可能应用
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Ddm ter 9, Hungary;
Backside etching; Nanostructure; SERS; PLD; Rhodamine 6G;
机译:激光诱导的背面湿蚀刻技术在熔融石英中制备亚微米光栅
机译:使用激光诱导的背面干法刻蚀技术生产亚微米级熔融石英光栅
机译:使用可见光诱导的背面湿法刻蚀,以KMnO_4溶液为吸收剂,对聚甲基丙烯酸甲酯基板进行表面微加工
机译:通过激光诱导的背面湿法刻蚀对UV透明材料进行表面微加工
机译:具有耦合器的平面波导太阳能聚光器,该耦合器由激光诱导的背面湿法刻蚀制成。
机译:通过组合激光诱导的背面湿法蚀刻和激光诱导的化学液相沉积方法将耐用的微铜图案沉积到玻璃中
机译:使用干法蚀刻技术制造表面声波滤波器
机译:Gaas晶圆制备亚微米沟道的双蚀刻技术及其在激光制备中的应用