Production of submicrometre fused silica gratings using laser-induced backside dry etching technique

摘要

Laser micromachining of transparent materials is a promising technique for producing micro-optical elements. Several types of both direct ( e. g. ablation) and indirect ( e. g. laser-induced backside wet etching: LIBWE) procedures have already been developed and presented in the last two decades. Here we present a new method (laser-induced backside dry etching (LIBDE)) in the analogy of LIBWE for the micro and nanoprocessing of transparent materials.