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The optical and structural properties of amorphous Nb_2O_5 thin films prepared by RF magnetron sputtering

机译:射频磁控溅射制备非晶Nb_2O_5薄膜的光学和结构性质

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Nb_2O_5 thin films were deposited on high temperature glass substrate by reactive RF magnetron sputtering using a Nb_2O_5 target in an Ar atmosphere. The relationships between structural and optical properties were studied using XRD, AFM and spectrophotometry. Argon pressure was selected from the range of 3-15mTorr to investigate its effect on the film properties results showed that as-deposited films were amorphous for all of the deposition pressures and flow ratios used. The refractive indices of the films were in the range 2.00-2.32 at the wavelength of 550 nm depending on the sputtering conditions. The films were also deposited with different thicknesses to determine the effects of the thickness on the optical properties of Nb_2O_5 films. The films were also deposited at 3 mTorr with the substrate temperature varied from room temperature (RT) to 300 ℃. As a result, it is seen that the refractive index increases with the increasing substrate temperature.
机译:在Ar气氛中,使用Nb_2O_5靶,通过反应RF磁控溅射将Nb_2O_5薄膜沉积在高温玻璃基板上。使用X射线衍射,原子力显微镜和分光光度法研究了结构和光学性质之间的关系。从3-15mTorr的范围内选择氩气压力,以研究其对薄膜性能的影响。结果表明,所沉积的薄膜在所使用的所有沉积压力和流量比下均为非晶态。取决于溅射条件,在550nm的波长下,膜的折射率在2.00-2.32的范围内。还以不同的厚度沉积膜,以确定厚度对Nb_2O_5膜的光学性能的影响。薄膜的沉积温度为3 mTorr,衬底温度从室温(RT)到300℃不等。结果,可见折射率随着基板温度的升高而增加。

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