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Performance of columnar CsI(Tl) scintillation films prepared on special pre-deposited layers

机译:在特殊预沉积层上制备的柱状CsI(Tl)闪烁膜的性能

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摘要

CsI(Tl) scintillation films are widely used for X-ray imaging because their micro-columnar structure can decrease the lateral spreading of scintillating light. But the CsI(Tl) films usually show a disorder structure near the interface of the substrate and film. In this work, CsI(Tl) scintillation films were prepared on the substrates covered by a special pre-deposited CsI layer. This pre-deposited layer shows the morphology of isolated islands with uniform distribution which is caused by solid-state dewetting. The inter-island distance is determined by the initial film thickness. It is found that the columns of the CsI(Tl) films deposited on the pre-deposited layer grew from bottom to the top without disorder. The column diameter is determined by the inter-island distance. The XRD patterns of the films show only [100] preferred orientation which was the same as those of the pre-deposited layers. The performances of the films including light output and spatial resolution have been improved when the films are prepared on this kind of special pre-deposited layers.
机译:CsI(Tl)闪烁膜被广泛用于X射线成像,因为它们的微柱状结构可以减少闪烁光的横向扩散。但是,CsI(T1)膜通常在衬底和膜的界面附近显示出无序结构。在这项工作中,在被特殊的预沉积CsI层覆盖的基板上制备了CsI(Tl)闪烁膜。该预沉积层显示出由固态去湿引起的具有均匀分布的孤立岛的形态。岛间距离由初始膜厚确定。发现沉积在预沉积层上的CsI(Tl)膜的列从底部到顶部无障碍地生长。柱直径由岛间距离确定。薄膜的XRD图案仅显示与预沉积层相同的[100]首选取向。当在这种特殊的预沉积层上制备膜时,包括光输出和空间分辨率的膜的性能已得到改善。

著录项

  • 来源
    《Applied Surface Science》 |2013年第1期|776-781|共6页
  • 作者单位

    Shanghai Key Laboratory of Special Artificial Microstructure Materials & Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, PR China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials & Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, PR China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials & Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, PR China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials & Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, PR China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials & Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, PR China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials & Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CsI(Tl) scintillation film; Pre-deposited layer; Solid-state dewetting; Columnar structure; Spatial resolution;

    机译:CsI(Tl)闪烁膜;预沉积层;固态去湿;柱状结构;空间分辨率;

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