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Influence of GaAs(001) pregrowth surface morphology and reconstruction on the growth of InGaAs layers

机译:GaAs(001)预生长表面形貌和重构对InGaAs层生长的影响

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摘要

The influence of pregrowth surface morphology and reconstruction upon the growth of In_(0.15)Ga_(0.85)As alloy layers was investigated. After obtaining different pregrowth surfaces, depositions of InGaAs were carried out by molecular-beam epitaxy (MBE). The real space ultrahigh vacuum scanning tunneling microscopy (STM) images showed the disciplinary changes between GaAs and InGaAs surface morphology. Reflection high energy electron diffraction (RHEED) has also been used to estimate InGaAs deposition. As STM images and RHEED oscillations showed, heteroepitaxial surface quality greatly depends on initial state of surface even form the earliest stages of deposition. Two reasons of the effects are proposed, a conjecture for the formation of surfaces morphology and its influence on subsequent growth is also proposed.
机译:研究了预生长表面形貌和重构对In_(0.15)Ga_(0.85)As合金层生长的影响。获得不同的预生长表面后,通过分子束外延(MBE)进行InGaAs的沉积。实际空间超高真空扫描隧道显微镜(STM)图像显示了GaAs和InGaAs表面形态之间的学科变化。反射高能电子衍射(RHEED)也已用于估算InGaAs沉积。如STM图像和RHEED振荡所示,异质外延表面质量甚至在沉积的最早阶段就很大程度上取决于表面的初始状态。提出影响的两个原因,也提出了表面形态形成的推测及其对随后生长的影响。

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