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首页> 外文期刊>Applied Surface Science >Preparation of clean and well-ordered hydrogen-terminated Si(110)-(1×1) surfaces and the measurements of vibrational modes
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Preparation of clean and well-ordered hydrogen-terminated Si(110)-(1×1) surfaces and the measurements of vibrational modes

机译:制备干净且有序的氢封端的Si(110)-(1×1)表面以及振动模量

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摘要

We propose electrochemical and wet chemical processes to prepare the clean and well-ordered hydrogen-terminated Si(110)-(l×1) surfaces, with our evaluation by low-energy electron-diffraction (LEED), high-resolution electron-energy-loss spectroscopy (HREELS) and X-ray photoelectron spectroscopy (XPS). Clear (1×1) LEED patterns indicated the two-dimensional space group of p2mg. The intrinsic Si—H bending and stretching modes and surface phonon modes, as well as hydrocarbon impurities were observed by HREELS. Among the procedures tested, the electrochemical etching in a NH_4F solution yielded the best ordered surface. The wet chemical etching produced the clean samples suitable for HREELS measurements.
机译:我们提出了电化学和湿化学方法,以制备干净且有序的氢封端的Si(110)-(l×1)表面,并通过低能电子衍射(LEED),高分辨率电子能进行评估损耗光谱(HREELS)和X射线光电子能谱(XPS)。清晰的(1×1)LEED模式指示p2mg的二维空间组。 HREELS观察到了固有的Si-H弯曲和拉伸模式,表面声子模式以及碳氢化合物杂质。在所测试的程序中,在NH_4F溶液中进行电化学蚀刻可获得最佳有序表面。湿法化学蚀刻产生了适合HREELS测量的干净样品。

著录项

  • 来源
    《Applied Surface Science》 |2013年第15期|90-92|共3页
  • 作者单位

    Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;

    Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;

    Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;

    Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;

    Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;

    Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;

    Center for Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan;

    RIKEN, 2-1 Hirosawa, Wako-shi, Saitama 351-0198, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Si(110); etching; LEED; HREELS; p2mg;

    机译:硅(110);蚀刻LEED;头巾;2;

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