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首页> 外文期刊>Applied Surface Science >Electrochromic performance, wettability and optical study of copper manganese oxide thin films: Effect of annealing temperature
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Electrochromic performance, wettability and optical study of copper manganese oxide thin films: Effect of annealing temperature

机译:铜锰氧化物薄膜的电致变色性能,润湿性和光学研究:退火温度的影响

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摘要

In the present work, the nanostructured copper manganese oxide (CMO) thin films were prepared from acetate based sol-gel precursors and deposited on glass and indium tin oxide (ITO) substrates by dip-coating technique. The films were annealed at 300, 400 and 500 ℃ in ambient atmosphere. The effects of annealing temperature on structural, morphological, wettability, electrochromic and optical properties of CMO thin films were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), energy dispersive spectroscopy (EDX), water contact angle measurement (WCA), cyclic voltammetry (CV) measurements and ultraviolet-visible (UV-vis) spectrophotometery. The presence of mixed oxide phases comprising of copper manganese oxide (CuMn_2O_4) and manganese oxide at different annealing temperature was confirmed by XRD patterns. The results showed that the Mn_3O_4 phase has been changed to Mn2O3 when the annealing temperature is increased from 300 to 500 ℃. The FESEM images indicated that the granular surface morphology was sensitive to annealing temperature. EDX studies indicated that the thin films contained 0, Mn and Cu species. Wettability studies showed that the water contact angle of the nanostructured CMO thin films coated on glass substrates was influenced by the variation of annealing temperature and the surface nature of thin films was changed from hydrophilic to hydrophobic. The results of CVs measurement indicated that the anodic and cathodic charge density and capacitance of all CMO samples decreased with increasing scan rate in potential range of -1-1 eV. Also, the annealed CMO thin film at 500 ℃ showed better electrochromic performance with respect to other samples at lower scan rate. The thickness, refractive index, extinction coefficient and optical band gap of thin films coated on glass substrates were calculated from reflectance and transmittance spectra using an iterative numerical method. The optical band gap of nanostructured CMO thin films increased with increasing annealing temperature.
机译:在目前的工作中,纳米结构的铜锰氧化物(CMO)薄膜是由醋酸盐基溶胶-凝胶前驱体制备的,并通过浸涂技术沉积在玻璃和铟锡氧化物(ITO)基板上。薄膜在环境气氛中分别于300、400和500℃退火。通过X射线衍射(XRD),场发射扫描电子显微镜(FESEM),能量色散谱(EDX),水接触角等表征了退火温度对CMO薄膜结构,形貌,润湿性,电致变色和光学性质的影响。测量(WCA),循环伏安(CV)测量和紫外可见(UV-vis)分光光度计。通过XRD图谱证实了在不同退火温度下存在由铜锰氧化物(CuMn_2O_4)和锰氧化物组成的混合氧化物相。结果表明,当退火温度从300℃提高到500℃时,Mn_3O_4相转变为Mn2O3。 FESEM图像表明颗粒表面形态对退火温度敏感。 EDX研究表明,该薄膜包含0,Mn和Cu物质。润湿性研究表明,退火温度的变化会影响涂覆在玻璃基板上的纳米结构CMO薄膜的水接触角,并且薄膜的表面性质从亲水性变为疏水性。 CVs测量结果表明,在-1-1 eV的电位范围内,所有CMO样品的阳极和阴极电荷密度和电容均随扫描速率的增加而降低。同样,退火后的CMO薄膜在较低扫描速率下相对于其他样品在500℃下表现出更好的电致变色性能。使用迭代数值方法从反射率和透射率光谱计算涂覆在玻璃基板上的薄膜的厚度,折射率,消光系数和光学带隙。纳米结构的CMO薄膜的光学带隙随退火温度的升高而增加。

著录项

  • 来源
    《Applied Surface Science》 |2014年第15期|289-299|共11页
  • 作者单位

    Department of Physics, Faculty of Science, University of Guilan, Namjoo Avenue, P.O. Box 413351914, Rasht, Iran;

    Department of Physics, Faculty of Science, University of Guilan, Namjoo Avenue, P.O. Box 413351914, Rasht, Iran;

    Department of Physics, Faculty of Sciences and Letters, Istanbul Technical University, Maslak, Istanbul, 34469, Turkey;

    Department of Physics, Faculty of Sciences and Letters, Istanbul Technical University, Maslak, Istanbul, 34469, Turkey;

    Department of Physics, Faculty of Sciences and Letters, Istanbul Technical University, Maslak, Istanbul, 34469, Turkey;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin film; Copper manganese oxide; Electrochromic properties; Wettability; Optical properties; Sol-gel;

    机译:薄膜;铜锰氧化物;电致变色性能;润湿性光学性质;溶胶凝胶;

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