首页> 外文期刊>Oriental Journal of Chemistry: An International Research Journal of Pure & Applied Chemistry >Effect of Annealing on the Activation Energy of Thin Films of Manganese Sulphide, Copper Phthalocyanine and Multilayer Manganese Sulphide-Copper Phthalocyanine from their Electrical Studies
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Effect of Annealing on the Activation Energy of Thin Films of Manganese Sulphide, Copper Phthalocyanine and Multilayer Manganese Sulphide-Copper Phthalocyanine from their Electrical Studies

机译:从电学研究中,退火对硫化锰,酞菁铜和多层硫化铜-酞菁薄膜的活化能的影响

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摘要

Manganese Sulphide (MnS) thin films are prepared onto glass substrates by chemical bath deposition (CBD) technique. Thin films of Copper phthalocyanine (CuPc) are also sublimed onto glass substrates in high vacuum at room temperature. Multi layer MnS- CuPc thin films are obtained from MnS films grown on glass substrates by CBD technique and subsequently vacuum subliming CuPc onto them. These films are annealed in air at different temperatures. Electrical conductivity studies are made separately on MnS, CuPc and multi layer MnS-CuPc thin films. Thermal activation energy of the as deposited and annealed samples are determined from the Arrhenius plot. It is found that the activation energy decreases with annealing temperature. This may be due to the reduction in trap sites during annealing.
机译:通过化学浴沉积(CBD)技术在玻璃基板上制备硫化锰(MnS)薄膜。铜酞菁(CuPc)薄膜也可以在室温下在高真空下升华到玻璃基板上。多层MnS-CuPc薄膜是通过CBD技术从玻璃基板上生长的MnS膜中获得的,然后将CuPc真空升华到其上。这些薄膜在不同温度的空气中退火。分别在MnS,CuPc和多层MnS-CuPc薄膜上进行电导率研究。沉积和退火样品的热活化能由Arrhenius图确定。发现活化能随退火温度降低。这可能是由于退火期间陷阱位点的减少。

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