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Influence of post-deposition heat treatment on optical properties derived from UV-vis of cadmium telluride (CdTe) thin films deposited on amorphous substrate

机译:沉积后热处理对沉积在非晶衬底上的碲化镉(CdTe)薄膜的紫外可见光光学特性的影响

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In this work, we report on post-deposition heat treatment (annealing)-induced change in optical properties derived from UV-vis study of CdTe thin films prepared on amorphous glass substrate by electron beam evaporation technique. Annealing effect gives rise to the enhancement in crystalline nature (zinc blende structure) of CdTe films with (1 1 1) preferred orientation. The average transmittance was increased with the annealing temperature and the slight shift in transmission threshold towards higher wavelength region revealed the systematic reduction in optical energy band gap. The existence of shallow level just below the conduction band, within the band gap was identified in the range of 0.23 and 0.14 eV for the films annealed at 200 and 450 degrees C, respectively. The optical quality of deposited films was confirmed by the photoluminescence study. In addition, the scanning electron microscopic measurement supports the result of X-ray diffraction study. The Swanepoel, Herve-Vandamme, and Wemple DiDomenico models have been employed to evaluate the various optical parameters of CdTe films. These results are correlated well with other physical properties and discussed with the possible concepts underlying the phenomena. (C) 2015 Elsevier B.V. All rights reserved.
机译:在这项工作中,我们报道了沉积后热处理(退火)引起的光学性能变化,这些变化是通过电子束蒸发技术在非晶玻璃基板上制备的CdTe薄膜的UV-vis研究得出的。退火效应可提高具有(1 1 1)优先取向的CdTe薄膜的晶体性质(锌共混物结构)。平均透射率随退火温度的升高而增加,透射阈值向较高波长区域的轻微移动表明光能带隙的系统减小。对于分别在200和450摄氏度下退火的薄膜,确定在带隙内,在导带以下的浅能级存在范围分别为0.23和0.14 eV。通过光致发光研究证实了沉积膜的光学质量。另外,扫描电子显微镜的测量结果支持了X射线衍射研究的结果。 Swanepoel,Herve-Vandamme和Wemple DiDomenico模型已用于评估CdTe薄膜的各种光学参数。这些结果与其他物理特性密切相关,并与现象背后的可能概念进行了讨论。 (C)2015 Elsevier B.V.保留所有权利。

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