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Nanostructured Zn and ZnO nanowire thin films for mechanical and self-cleaning applications

机译:用于机械和自清洁应用的纳米结构化Zn和ZnO纳米线薄膜

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摘要

Nanostructured Zn metal films were deposited by thermal evaporation, on borosilicate glass, Quartz, sapphire, lanthanum aluminate and yttria stabilized zirconia substrates. The as-deposited films are nanocrystalline and show a morphology that consists of triangular nanosheets. The films are hydrophobic with contact angles between 102 degrees and 120 degrees with hardness and Young's modulus between 0.15-0.8 GPa and 18-300 GPa, respectively. Thermal annealing of the films at 500 degrees C results only in partial oxidation of Zn to ZnO, which indicates good oxidation resistance. Annealing also causes transformation of the Zn nanosheets into ZnO nanowires that are polycrystalline in nature. The ZnO nanowires are superhydrophobic with contact angles between 159 degrees and 162 degrees contact angle hysteresis between 5 degrees and 10 degrees and exhibit a reversible superhydrophobic-hydrophilic transition under UV irradiation. The nanowires are much softer than the as-deposited Zn metal films, with hardness between 0.02 and 0.4 GPa and Young's modulus between 3 and 35 GPa. The current study thus demonstrates a simple process for fabrication of nanostructured Zn metal films followed by a one-step transformation to nanowires with properties that will be very attractive for mechanical and self-cleaning applications. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过热蒸发将纳米结构的Zn金属膜沉积在硼硅酸盐玻璃,石英,蓝宝石,铝酸镧和氧化钇稳定的氧化锆衬底上。沉积的薄膜是纳米晶体,并显示出由三角形纳米片组成的形态。该膜是疏水的,接触角在102度和120度之间,硬度和杨氏模量分别在0.15-0.8GPa和18-300GPa之间。薄膜在500摄氏度下的热退火仅导致Zn部分氧化为ZnO,这表明良好的抗氧化性。退火还引起Zn纳米片转变成本质上是多晶的ZnO纳米线。 ZnO纳米线是超疏水的,接触角在159度和162度之间,接触角滞后在5度和10度之间,并且在紫外线照射下表现出可逆的超疏水-亲水转变。纳米线比沉积的锌金属膜柔软得多,其硬度在0.02至0.4 GPa之间,杨氏模量在3至35 GPa之间。因此,当前的研究证明了制造纳米结构Zn金属膜的简单方法,然后一步一步转化为具有对机械和自清洁应用非常有吸引力的特性的纳米线。 (C)2015 Elsevier B.V.保留所有权利。

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