...
首页> 外文期刊>Applied Surface Science >Surface conductivity dependent dynamic behaviour of an ultrafine atmospheric pressure plasma jet for microscale surface processing
【24h】

Surface conductivity dependent dynamic behaviour of an ultrafine atmospheric pressure plasma jet for microscale surface processing

机译:用于微尺度表面处理的超细常压等离子体射流的与表面电导率有关的动力学行为

获取原文
获取原文并翻译 | 示例
           

摘要

An experimental study on the dynamic behaviour of microcapillary atmospheric pressure plasma jets (APPJs) with 5 mu m tip size for surfaces of different conductivity is reported. Electrical and spatio-temporal characteristics of the APPJs are monitored using high voltage probe, current monitor and high speed intensified charge couple device camera. From these experimental results, we presented a simple model to understand the electrical discharge characteristics of the capillary APPJs with double electrodes, and estimated the velocity of the ionization fronts in the jet and the electron density to be 3.5-4.2 km/s and 2-7 x 10(17) m(-3). By analyzing the dynamics of the microcapillary APPJs for different substrate materials, it was found that the surface irradiation area strongly depended on the substrate conductivity and permittivity, especially in the case of polymer-like substrate, surface irradiation area was significantly broadened probably due to the repelling behaviour of the plasma jets from the accumulated electrical charges on the polymer surface. The effect of applying a substrate bias in the range from -900 V to +900 V on the plasma irradiation onto the substrates was also investigated. From the knowledge of the present results, it is helpful for choosing the substrate materials for microscale surface modification. (C) 2016 Elsevier B.V. All rights reserved.
机译:报道了针对不同电导率表面的5 µm尖端微毛细管大气压等离子体射流(APPJ)动力学行为的实验研究。 APPJ的电和时空特性使用高压探头,电流监控器和高速增强型电荷耦合器件相机进行监控。从这些实验结果中,我们提出了一个简单的模型来理解带有双电极的毛细管APPJ的放电特性,并估计喷射流中电离前沿的速度和电子密度分别为3.5-4.2 km / s和2- 7 x 10(17)m(-3)。通过分析不同基质材料的微毛细管APPJ的动力学,发现表面辐照面积强烈取决于基质的电导率和介电常数,特别是在聚合物样基质的情况下,表面辐照面积可能显着加宽。从聚合物表面上累积的电荷排斥等离子体射流的行为。还研究了在-900 V至+900 V范围内施加衬底偏压对等离子体辐射到衬底上的影响。根据当前结果的知识,有助于选择用于微米级表面改性的基材。 (C)2016 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号