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Atmospheric deposition process for enhanced hybrid organic-inorganic multilayer barrier thin films for surface protection

机译:大气沉积工艺用于增强有机-无机杂化多层阻挡薄膜的表面保护

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In this study, organic polymer poly-vinyl acetate (PVA) and inorganic aluminum oxide (Al2O3) have been used together to fabricate a hybrid barrier thin film for the protection of PET substrate. The organic thin films of PVA were developed through roll to roll electrohydrodynamic atomization (R2R-EHDA) whereas the inorganic thin films of Al2O3 were grown by roll to roll spatial atmospheric atomic layer deposition (R2R-SAALD) for mass production. The use of these two technologies together to develop a multilayer hybrid organic-inorganic barrier thin films under atmospheric conditions is reported for the first time. These multilayer hybrid barrier thin films are fabricated on flexible PET substrate. Each layer of Al2O3 and PVA in barrier thin film exhibited excellent morphological, chemical and optical properties. Extremely uniform and atomically thin films of Al2O3 with average arithmetic roughness (Ra) of 1.64 nm and 1.94 nm respectively concealed the non-uniformity and irregularities in PVA thin films with Ra of 2.9 nm and 3.6 nm respectively. The optical transmittance of each layer was similar to 80-90% while the water vapor transmission rate (WVTR) of hybrid barrier was in the range of similar to 2.3 x 10(-2) gm(-2) day(-1) with a total film thickness of similar to 200 nm. Development of such hybrid barrier thin films with mass production and low cost will allow various flexible electronic devices to operate in atmospheric conditions without degradation of their properties. (C) 2017 Elsevier B.V. All rights reserved.
机译:在这项研究中,有机聚合物聚醋酸乙烯酯(PVA)和无机氧化铝(Al2O3)一起用于制造混合阻隔薄膜,以保护PET基材。 PVA的有机薄膜是通过卷对卷的电动流体雾化(R2R-EHDA)显影的,而Al2O3的无机薄膜是通过卷对卷的空间大气原子层沉积(R2R-SAALD)进行批量生产的。首次报道了将这两种技术一起用于在大气条件下开发多层有机-无机杂化杂化薄膜。这些多层混合阻挡薄膜是在柔性PET基板上制造的。阻挡薄膜中的每一层Al2O3和PVA均表现出优异的形态,化学和光学性质。平均算术粗糙度(Ra)分别为1.64 nm和1.94 nm的极均匀且原子级的Al2O3薄膜掩盖了Ra分别为2.9 nm和3.6 nm的PVA薄膜的不均匀性和不规则性。每层的透光率接近80-90%,而混合屏障的水蒸气透过率(WVTR)接近2.3 x 10(-2)gm(-2)day(-1),总膜厚类似于200 nm。具有大量生产和低成本的这种混合阻挡薄膜的开发将允许各种柔性电子器件在大气条件下操作而不会降低其性能。 (C)2017 Elsevier B.V.保留所有权利。

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