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Controlling the optical parameters of self-assembled silver films with wetting layers and annealing

机译:通过润湿层和退火控制自组装银膜的光学参数

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Graphical abstract Display Omitted Highlights Both Ni and Ge wetting layers decrease the Drude component of silver permittivity. Ni wetting film causes narrowing and diminishing of the Lorentz interband transition peak. Intensity of Ge segregation-induced band can be controlled by annealing. Annealing at temperatures close to the melting point may lead to alloy formation. Abstract We investigated the influence of presence of Ni and Ge wetting layers as well as annealing on the permittivity of Ag films with thicknesses of 20, 35 and 65nm. Most of the research on thin silver films deals with very small (20nm) or relatively large (≥50nm) thicknesses. We studied the transition region (around 30nm) from charge percolation pathways to fully continuous films and compared the values of optical parameters among silver layers with at least one fixed attribute (thickness, wetting and capping material, post-process annealing). Our study, based on atomic force microscopy, ellipsometric and X-ray photoelectron spectroscopy measurements, shows that utilizing a wetting layer is comparable to increasing the thickness of the silver film. Both operations decrease the roughness-to-thickness ratio, thus decreasing the scattering losses and both narrow the Lorentz-shaped interband transition peak. However, while increasing silver thickness increases absorption on the free carriers, the use of wetting layers influences the self-assembled internal structure of silver films in such a way, that the free carrier absorption decreases. Wetting layers also introduce additional contributions from effects like segregation or diffusion, which evolve in time and due to annealing.
机译: 图形摘要 < ce:simple-para id =“ spar0030” view =“ all” /> 省略显示 突出显示 < ce:para id =“ par0005” view =“ all”> Ni和Ge浸润层均会降低Drude com 镍润湿膜会导致Lorentz带间跃迁峰变窄和减小。 Ge偏析诱导带的强度可以通过退火来控制。 在接近熔点的温度下退火导致合金形成。 摘要 nm的Ag膜介电常数的影响。对银薄膜的大多数研究涉及非常小的厚度(<20 nm)或相对较大的厚度(≥50 nm)。我们研究了从电荷渗流路径到完全连续薄膜的过渡区域(大约30 nm),并比较了具有至少一个固定属性(厚度,润湿性和覆盖材料,后处理退火)。我们基于原子力显微镜,椭圆偏振和X射线光电子能谱测量的研究表明,使用润湿层可与增加银膜的厚度相媲美。两种操作均降低了粗糙度/厚度比,从而降低了散射损耗,并且均使Lorentz形带间跃迁峰变窄。但是,虽然增加银的厚度会增加对自由载流子的吸收,但是使用润湿层会以这种方式影响银膜的自组装内部结构,从而降低自由载流子的吸收。润湿层还会引入诸如偏析或扩散之类的额外影响,这些影响会随着时间的流逝并由于退火而演变。

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