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Effect of film thickness on NO2 gas sensing properties of sprayed orthorhombic nanocrystalline V2O5 thin films

机译:膜厚对正交晶态纳米V2O5喷涂薄膜NO2气敏性能的影响

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The nanocrystalline V2O5 thin films with different thicknesses have been grown onto the glass substrates using chemical spray pyrolysis (CSP) deposition method. The XRD study shows that the films exhibit an orthorhombic crystal structure. The narrow scan X-ray photoelectron spectrum of V-2p core level doublet gives the binding energy difference of 7.3 eV, indicating that the V5+ oxidation state of vanadium. The FE-SEM micrographs show the formation of nanorods-like morphology. The AFM micrographs show the high surface area to volume ratio of nanocrystalline V2O5 thin films. The optical study gives the band gap energy values of 2.41 eV, 2.44 eV, 2.47 eV and 2.38 eV for V2O5 thin films deposited with the thicknesses of 423 nm, 559 nm, 694 nm and 730 nm, respectively. The V2O5 film of thickness 559 nm shows the NO2 gas response of 41% for 100 ppm concentration at operating temperature of 200 degrees C with response and recovery times of 20 s and 150 s, respectively. Further, it shows the rapid response and reproducibility towards 10 ppm NO2 gas concentration at 200 degrees C. Finally, NO2 gas sensing mechanism based on chemisorption process is discussed. (C) 2017 Published by Elsevier B.V.
机译:使用化学喷雾热解(CSP)沉积方法,已将具有不同厚度的纳米V2O5薄膜生长到玻璃基板上。 X射线衍射研究表明,该膜表现出正交晶体结构。 V-2p核能级双峰的窄扫描X射线光电子能谱给出的结合能差为7.3 eV,表明钒的V5 +氧化态。 FE-SEM显微照片显示了纳米棒状形态的形成。 AFM显微照片显示出纳米晶V2O5薄膜的高表面积体积比。光学研究表明,对于厚度分别为423 nm,559 nm,694 nm和730 nm的V2O5薄膜,其带隙能量值为2.41 eV,2.44 eV,2.47 eV和2.38 eV。厚度为559 nm的V2O5膜在200摄氏度的工作温度下,对于100 ppm浓度的NO2气体响应显示为41%,响应时间和恢复时间分别为20 s和150 s。此外,它显示了在200摄氏度下对10 ppm NO2气体浓度的快速响应和可再现性。最后,讨论了基于化学吸附过程的NO2气体传感机制。 (C)2017由Elsevier B.V.发布

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