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Fabrication of a Graphene/ZnO based p-n junction device and its ultraviolet photoresponse properties

机译:石墨烯/ ZnO基p-n结器件的制备及其紫外光响应特性

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Graphene with a zero-bandgap energy is easily doped using a chemical dopant, and a shift upwards or downwards in the Fermi level is generated. Moreover, the integration of inorganic material into the doped graphene changes the physical and chemical properties of the material. For this purpose, we successfully fabricated a p-n junction device by depositing an n-typed ZnO layer on p-doped graphene and studied the ultraviolet (UV) photoresponse properties under a photocurrent (UV light on) and a dark current (UV light off). Two devices, lateral and vertical, were developed by alternating the thickness of the ZnO layer, and the photoresponse mechanisms were described on the basis of the contact potential difference. (C) 2016 Elsevier B.V.All rights reserved.
机译:具有零带隙能量的石墨烯易于使用化学掺杂剂进行掺杂,并且在费米能级中产生向上或向下的移位。此外,将无机材料整合到掺杂的石墨烯中会改变材料的物理和化学性质。为此,我们通过在p掺杂的石墨烯上沉积n型ZnO层成功地制造了pn结器件,并研究了在光电流(UV灯亮)和暗电流(UV灯灭)下的紫外光响应特性。 。通过交替改变ZnO层的厚度,开发出了横向和纵向两个器件,并根据接触电势差描述了光响应机理。 (C)2016 Elsevier B.V.保留所有权利。

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