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Visible sub-band gap photoelectron emission from nitrogen doped and undoped polycrystalline diamond films

机译:氮掺杂和非掺杂多晶金刚石薄膜的可见亚带隙光电子发射

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摘要

In this study the origin of visible sub-band gap photoelectron emission (PEE) from polycrystalline diamond films is investigated. The PEE yields as a function of temperature were studied in the wavelengths range of 360-520 nm. Based on the comparison of electron emission yields from diamond films deposited on silicon and molybdenum substrates, with different thicknesses and nitrogen doping levels, we suggested that photoelectrons are generated from nitrogen related centers in diamond. Our results show that diamond film thickness and substrate material have no significant influence on the PEE yield. We found that nanocrystalline diamond films have low electron emission yields, compared to microcrystalline diamond, due to the presence of high amount of defects in the former, which trap excited electrons before escaping into the vacuum. However, the low PEE yield of nanocrystalline diamond films was found to increase with temperature. The phenomenon was explained by the trap assisted photon enhanced thermionic emission (ta-PETE) model. According to the to-PETE model, photoelectrons are trapped by shallow traps, followed by thermal excitation at elevated temperatures and escape into the vacuum. Activation energies of trap levels were estimated for undoped nanocrystalline, undoped microcrystalline and N-doped diamond films using the Richardson-Dushman equation, which gives 0.13, 0.39 and 0.04 eV, respectively. Such low activation energy of trap levels makes the to-PETE process very effective at elevated temperatures. (C) 2017 Elsevier B.V. All rights reserved.
机译:在这项研究中,研究了多晶金刚石薄膜的可见亚带隙光电子发射(PEE)的起源。在360-520 nm的波长范围内研究了PEE产量与温度的关系。基于比较不同厚度和氮掺杂水平的沉积在硅和钼衬底上的金刚石膜的电子发射率的比较,我们建议光电子是由金刚石中与氮有关的中心产生的。我们的结果表明,金刚石膜的厚度和基底材料对PEE产量没有显着影响。我们发现,与微晶金刚石相比,纳米晶金刚石膜的电子发射率较低,这是由于前者中存在大量缺陷,这些缺陷会在逃逸到真空之前捕获激发的电子。然而,发现纳米晶金刚石膜的低PEE产率随温度增加。该现象由陷阱辅助光子增强热电子发射(ta-PETE)模型解释。根据to-PETE模型,光电子被浅陷阱捕获,然后在高温下被热激发并逃逸到真空中。使用Richardson-Dushman方程估算了未掺杂的纳米晶体,未掺杂的微晶体和N掺杂金刚石薄膜的陷阱能级激活能,分别给出了0.13、0.39和0.04 eV。如此低的陷阱能级活化能使得to-PETE工艺在高温下非常有效。 (C)2017 Elsevier B.V.保留所有权利。

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  • 来源
    《Applied Surface Science》 |2017年第15期|414-422|共9页
  • 作者单位

    Technion Israel Inst Technol, Schulich Fac Chem, IL-32000 Haifa, Israel;

    Technion Israel Inst Technol, Schulich Fac Chem, IL-32000 Haifa, Israel;

    Technion Israel Inst Technol, Schulich Fac Chem, IL-32000 Haifa, Israel;

    Technion Israel Inst Technol, Schulich Fac Chem, IL-32000 Haifa, Israel;

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