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MOCVD techniques for the production of coated conductors

机译:MOCVD技术用于生产涂层导体

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摘要

New deposition techniques are used for MOCVD of YBCO-, buffer- and protective layers in a reel to reel system. This system consists of three tape reactors and evaporators. So it is possible to deposit the superconductor, the buffer layer and a protective layer in situ in one vacuum system. The operativeness of the reactors were tested separately. In the YBCO reactor superconducting films have been deposited with critical current densities over 1 MA/cm/sup 2/ at 77 K on moved textured Nickel tapes at a transport velocity of 4 m/h. Textured Ni substrates were coated in the buffer layer reactor with CeO/sub 2/ and in first experiments a Ag layer was deposited by MOCVD onto the YBCO film.
机译:新的沉积技术用于卷到卷系统中的YBCO-,缓冲层和保护层的MOCVD。该系统由三个带式反应器和蒸发器组成。因此可以在一个真空系统中原位沉积超导体,缓冲层和保护层。反应器的可操作性分别进行了测试。在YBCO反应器中,超导膜以临界电流密度超过1 MA / cm / sup 2 /的速度在77 K时以4 m / h的传输速度沉积在移动的纹理化镍带上。在缓冲层反应器中用CeO / sub 2 /涂覆织构好的Ni基板,在第一个实验中,通过MOCVD将Ag层沉积到YBCO膜上。

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