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Improved Characteristics of Intrinsically Shunted ${rm Nb/Al}-{rm AlO}_{x}-{rm Nb}$ Josephson Junctions

机译:本征分流的$ {rm Nb / Al}-{rm AlO} _ {x}-{rm Nb} $约瑟夫森结的改善的特性

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Josephson junctions with non-hysteretic current-voltage characteristics form the basis of most superconducting electronic circuits including RSFQ logic and programmable Josephson voltage standards. In contrast to conventional SIS devices, ${rm Nb/Al}-{rm AlO}_{x}-{rm Nb}$ (SNIS) junctions with an additional comparatively thick Al interlayer and a comparatively thin barrier ${rm AlO}_{x}$ are intrinsically shunted at $Tgeq 4.2 {rm K}$ . In this contribution, we provide experimental and theoretical arguments proving that this finding is mainly explained by a broad distribution of highly-conductive barrier transparencies with a significant effect from nearly ballistic modes. An additional advantage of the proposed SNIS junctions is possibility to tune the critical voltage value by modifying Nb and/or Al film thicknesses. With observations of wide Shapiro steps up to 1.25 V at 6.3 K we show that this type of Josephson junctions can be successfully used at temperatures above 4.2 K. The presence of well-developed quantized voltage features even at 7.2 K means that ${rm Nb/Al}-{rm AlO}_{x}-{rm Nb}$ devices can successfully operate far above the liquid helium temperature and, in principle, are compatible with two-stage cryocoolers.
机译:具有非滞后电流-电压特性的约瑟夫逊结形成了大多数超导电子电路的基础,包括RSFQ逻辑和可编程的约瑟夫森电压标准。与常规SIS器件相比,$ {rm Nb / Al}-{rm AlO} _ {x}-{rm Nb} $(SNIS)结具有额外的相对较厚的Al中间层和相对较薄的势垒$ {rm AlO} _ {x} $本质上在$ Tgeq 4.2 {rm K} $处被分流。在这一贡献中,我们提供了实验和理论论证,证明了这一发现主要是由高导电性势垒透明胶片的广泛分布所造成的,而这种影响主要来自近乎弹道模式。提出的SNIS结的另一个优点是可以通过修改Nb和/或Al膜的厚度来调节临界电压值。通过观察到在6.3 K时高达1.25 V的Shapiro宽阶跃,我们证明了这种类型的Josephson结可以在4.2 K以上的温度下成功使用。即使在7.2 K时也存在完善的量化电压特性,这意味着$ {rm Nb / Al}-{rm AlO} _ {x}-{rm Nb} $设备可以成功地在液氦温度以上运行,并且原则上与两级低温冷却器兼容。

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