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Measurement of Epitaxial NbN/AlN/NbN Tunnel Junctions With a Low Critical Current Density at Low Temperature

机译:低温下低临界电流密度的外延NbN / AlN / NbN隧道结的测量

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Superconducting qubit circuits require high quality low critical current density Josephson tunnel junctions. We have developed high quality epitaxial NbN/AlN/NbN tunnel junctions with critical current density, ${rm J}_{rm c}$, ranging from as low as a few ${rm A/cm}^{2}$ to a few tens of ${rm kA/cm}^{2}$. In this work, we measured current–voltage characteristics for junctions with a ${rm J}_{rm c}sim 32 {rm A/cm}^{2}$ in the temperature range from 17 mK to above 6.7 K. All the junctions are in good quality and have a high gap voltage ($>$ 5.5 mV). We found that the junctions' sub-gap resistances were temperature dependent above 2.5 K and saturated at temperatures below 2.5 K. A junction sub-gap leakage current ${rm I}_{rm r}$ of about 23 pA was measured. The voltage noise power spectral density for 3 junctions with different sizes has been measured at the base temperature of 17 mK with the junctions biased above the gap voltage. The spectral densities clearly show $1/f$ behavior at low frequency and are proportional to the junction's linear dimension.
机译:超导量子位电路需要高质量,低临界电流密度的约瑟夫森隧道结。我们开发了高质量的外延NbN / AlN / NbN隧道结,其临界电流密度为$ {rm J} _ {rm c} $,范围从低至$ {rm A / cm} ^ {2} $至几十美元{rm kA / cm} ^ {2} $。在这项工作中,我们在从17 mK到6.7 K以上的温度范围内,使用$ {rm J} _ {rm c} sim 32 {rm A / cm} ^ {2} $测量结点的电流-电压特性。结点质量良好,且间隙电压高($> $ 5.5 mV)。我们发现,结的子间隙电阻与温度有关,高于2.5 K,并且在低于2.5 K的温度下达到饱和。测得的结子间隙漏电流$ {rm I} _ {rm r} $约为23 pA。已在17 mK的基准温度下测量了3个具有不同尺寸的结的电压噪声功率谱密度,这些结的偏置电压高于间隙电压。频谱密度清楚地显示了低频下的$ 1 / f $行为,并且与结的线性尺寸成正比。

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