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Chemically deposited Sn-doped PbS thin films for infrared photodetector applications

机译:用于红外光电探测器应用的化学沉积的Sn掺杂的PBS薄膜

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摘要

Lead sulfide is a potential infrared (IR) photodetector material because of its favorable optoelectronic properties. The physical and chemical properties of PbS can be modified by a systematic doping of elements. In this study, we have doped 1-3 at% of Sn into PbS by a chemical bath deposition method. The undoped PbS films exhibited cubic crystal structure with a lattice parameter of a = 0.594 nm, an uneven grain growth, a direct optical band gap of 0.44 eV and a hole mobility of 8.9 cm~2 V~(-1) s~(-1). The Sn-doping has improved the microstructure and slightly decreased the band gap of PbS. The hole mobility of PbS films has increased to 20 cm~2 V~(-1)s~(-1) with Sn-doping (1-2 at%). Thus, the PbS films grown by Sn-doping with improved microstructure, decreased band gap, and increased electrical properties are beneficial for IR photodetector applications.
机译:硫化铅是一种潜在的红外(IR)光电探测器材料,因为其有利的光电性能。 PBS的物理和化学性质可以通过系统的系统掺杂来修改。 在这项研究中,通过化学浴沉积方法,我们将1-3%的Sn%掺杂为PBS。 未掺杂的PBS膜具有α= 0.594nm的晶格参数的立方晶体结构,晶粒生长不均匀,直接光带隙为0.44eV,孔迁移率为8.9cm〜2 V〜( - 1)。 Sn掺杂改善了微观结构并略微降低了PBS的带隙。 PBS膜的空穴迁移率增加到20cm〜2V〜(-1)S〜(-1),SN掺杂(1-2at%)。 因此,通过Sn-掺杂而生长的PBS膜具有改善的微观结构,减小的带隙和增加的电性能是有益的IR光电探测器应用。

著录项

  • 来源
    《Applied Physics》 |2021年第9期|645.1-645.6|共6页
  • 作者单位

    Center for Optoelectronic Materials and Devices Korea Institute of Science and Technology (KIST) Seoul 02792 South Korea Department of Electronic Engineering Yeungnam University 280 Daehak-Ro Gyeongsan Gyeongbuk 38541 South Korea;

    Department of Electronic Engineering Yeungnam University 280 Daehak-Ro Gyeongsan Gyeongbuk 38541 South Korea;

    Center for Optoelectronic Materials and Devices Korea Institute of Science and Technology (KIST) Seoul 02792 South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    PbS thin films; CBD; Sn-doping; XPS; FTIR;

    机译:PBS薄膜;CBD;Sn-掺杂;XPS;FTIR.;

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