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首页> 外文期刊>Applied Physics >Optimization design for high-quality factor 1.3 μm InAs/InGaAs quantum dot square microcavity lasers on silicon with output waveguide structures
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Optimization design for high-quality factor 1.3 μm InAs/InGaAs quantum dot square microcavity lasers on silicon with output waveguide structures

机译:具有输出波导结构的硅上高质量因子1.3μmInAs / InGaAs量子点方形微腔激光器的优化设计

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摘要

We, first, demonstrate an optimized structure design and analyze the optical mode properties of 1.3 mu m wavelength square microcavity lasers on silicon with InAs/InGaAs quantum-dot active region and mid-point output waveguides. Si-based square microcavities with whispering-gallery-like modes have been proposed for optimizing their quality factors (Q factors). Three-dimensional finite-difference time-domain method is used to numerically analyze the optical mode characteristics. The influences of the side-length of the microcavity, the output waveguide width, and the etching depth on the optical modes of the microcavity are investigated in detail. It indicates that the Q factor increases with increasing etching depth, and decreases rapidly as the waveguide width increases. The results show that with the side length of 18 mu m, the waveguide width of 1.0 mu m, and the etching depth of 3.5 mu m, the Q factor is the highest, and the mode distribution is optimal. The mode wavelength and Q factor are 1305.9 nm and 4694.8, respectively. Advantages of more stable and evenly distributed mode profiles for Si-based square microcavity lasers have been demonstrated, and compared with the Si-based disk microcavity (microdisk) lasers. It promises a potential alternative laser structure for Si-based optoelectronic integration.
机译:我们首先演示一种优化的结构设计,并分析具有InAs / InGaAs量子点有源区和中点输出波导的1.3μm波长方形微腔激光器在硅上的光学模式特性。硅基方形微腔具有耳语画廊式模式已被提出来优化其品质因数(Q因子)。使用三维时域有限差分法对光学模式特性进行了数值分析。详细研究了微腔的边长,输出波导宽度和刻蚀深度对微腔光学模式的影响。这表明Q因子随刻蚀深度的增加而增加,并随着波导宽度的增加而迅速减小。结果表明,边长为18μm,波导宽度为1.0μm,蚀刻深度为3.5μm时,Q因子最高,模式分布最佳。模波长和Q因子分别为1305.9 nm和4694.8。已经证明了基于Si的方形微腔激光器具有更稳定和均匀分布的模式轮廓的优点,并与基于Si的盘微腔(微盘)激光器进行了比较。它有望为基于Si的光电集成提供潜在的替代激光器结构。

著录项

  • 来源
    《Applied Physics》 |2019年第8期|578.1-578.9|共9页
  • 作者单位

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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