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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >Fabrication of ordered arrays of silicon cones by optical diffraction in ultrafast laser etching with SF_6
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Fabrication of ordered arrays of silicon cones by optical diffraction in ultrafast laser etching with SF_6

机译:在SF_6超快激光蚀刻中通过光学衍射制造有序硅锥阵列

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摘要

We report the fabrication of ordered rows of conical spikes on a Si(1 1 1) substrate by etching with a femtosecond pulsed laser in the presence of SF_6 gas. This is achieved by the creation of an optical near-field diffraction pattern when a copper wire (diameter ~ 140 μm) is placed on the surface. Measurements of the height, base width and average separation of the silicon cones at two irradiation wavelengths (780 nm and 390 nm) confirm the important role of the optical parameters in the photochemical etching process. Moreover, the dependence of average cone separation on the laser repetition rate indicates that long-timescale processes such as post-pulse chemical interactions are important in cone formation.
机译:我们报告了在存在SF_6气体的情况下,用飞秒脉冲激光蚀刻在Si(1 1 1)基板上制造的有序圆锥形尖峰行。这是通过将铜线(直径〜140μm)放置在表面上而产生近场光学衍射图样来实现的。在两个照射波长(780 nm和390 nm)下测量硅锥的高度,基极宽度和平均间距,证实了光学参数在光化学蚀刻过程中的重要作用。此外,平均锥体间距与激光重复频率的相关性表明,长时间的过程(例如脉冲后化学相互作用)在锥体形成中很重要。

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