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首页> 外文期刊>Applied Physics A: Materials Science & Processing >Table-top kHz hard X-ray source with ultrashort pulse duration for time-resolved X-ray diffraction
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Table-top kHz hard X-ray source with ultrashort pulse duration for time-resolved X-ray diffraction

机译:具有超短脉冲持续时间的台式kHz硬X射线源,用于时间分辨X射线衍射

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摘要

The interaction of ultrashort laser pulses with solid state targets is studied concerning the production of short X-ray pulses with photon energies up to about 10 keV. The influence of various parameters such as pulse energy, repetition rate of the laser system, focusing conditions, the application of prepulses, and the chirp of the laser pulses on the efficiency of this highly nonlinear process is examined. In order to increase the X-ray flux, the laser pulse energy is increased by a 2nd multipass amplifier from 750 μJ to 5 mJ. By applying up to 4 mJ of the pulse energy a X-ray flux of 4 × 10~(10) Fe Kα photons/s or 2.75 × 10~(10) Cu Kα. Photons/s are generated. The energy conversion efficiency is therefore calculated to η_(Fe)≈ 1.4 × 10~(-5) and η_(Cu) 1.0 × 10~(-5). The X-ray source size is determined to 15 × 25 μm~2. By focusing the produced X-rays using a toroidally bent crystal a quasi-monochromatic X-ray point source with a diameter of 56 μm × 70μm is produced containing ≈10~4 Fe K_(α1) photons/s which permits the investigation of lattice dynamics on a picosecond or even sub-picosecond time scale. The lattice movement of a GaAs( 111) crystal is shown as a typical application.
机译:研究了超短激光脉冲与固态靶的相互作用,涉及产生光子能量高达约10 keV的短X射线脉冲。研究了各种参数的影响,例如脉冲能量,激光系统的重复率,聚焦条件,预脉冲的施加以及激光脉冲的rp对这种高度非线性过程效率的影响。为了增加X射线通量,第二个多通道放大器将激光脉冲能量从750μJ增加到5 mJ。通过施加高达4 mJ的脉冲能量,X射线通量为4×10〜(10)FeKα光子/ s或2.75×10〜(10)CuKα。产生光子/秒。因此,能量转换效率被计算为η_(Fe)≈1.4×10〜(-5)和η_(Cu)1.0×10〜(-5)。 X射线源尺寸确定为15×25μm〜2。通过使用环形弯曲的晶体聚焦产生的X射线,产生了直径为56μm×70μm的准单色X射线点源,其中包含≈10〜4 Fe K_(α1)光子/ s,可以研究晶格皮秒甚至亚皮秒级时间尺度上的动态变化。 GaAs(111)晶体的晶格运动显示为典型应用。

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  • 作者单位

    Center for Nanotechnology, CeNTech, Heisenbergstr. 11, 48149 Muenster, Germany Physikalisches Institut, Westfalische Wilhelms-Universitaet, Wilhelm-Klemm-Str. 10, 48149 Munster, Germany;

    Center for Nanotechnology, CeNTech, Heisenbergstr. 11, 48149 Muenster, Germany Physikalisches Institut, Westfalische Wilhelms-Universitaet, Wilhelm-Klemm-Str. 10, 48149 Munster, Germany;

    Center for Nanotechnology, CeNTech, Heisenbergstr. 11, 48149 Muenster, Germany Physikalisches Institut, Westfalische Wilhelms-Universitaet, Wilhelm-Klemm-Str. 10, 48149 Munster, Germany;

    Center for Nanotechnology, CeNTech, Heisenbergstr. 11, 48149 Muenster, Germany Physikalisches Institut, Westfalische Wilhelms-Universitaet, Wilhelm-Klemm-Str. 10, 48149 Munster, Germany;

    Center for Nanotechnology, CeNTech, Heisenbergstr. 11, 48149 Muenster, Germany Physikalisches Institut, Westfalische Wilhelms-Universitaet, Wilhelm-Klemm-Str. 10, 48149 Munster, Germany;

    Institut fuer Optik und Quantenelektronik, Max-Wien-Platz 1, 07743 Jena, Germany;

    Institut fuer Optik und Quantenelektronik, Max-Wien-Platz 1, 07743 Jena, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ultrafast processes; optical pulse generation and pulse compression; laser-plasma interactions; hard X-ray sources;

    机译:超快过程;光脉冲产生和脉冲压缩;激光-等离子体相互作用;硬X射线源;

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