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Photoluminescence study of Si doped and undoped Chalcopyrite CuGaSe_2 thin films

机译:掺杂和不掺杂硅的黄铜矿CuGaSe_2薄膜的光致发光研究

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摘要

Photoluminescence (PL) characteristics have been studied on undoped and Si-doped CuGaSe2 single crystal thin films grown on GaAs (001) substrate by migration-enhanced epitaxy. Room temperature PL spectrum of an undoped layer clearly shows free excitonic emission bands related to the minimum band-edge and to the split-off valence band, but no discernible emission has been observed in the low energy area. At 4.2 K, the excitonic emission due to the split-off valence band disappears. Instead, two additional emissions appear at 1.68 and 1.715 eV which are attributed to the bound exciton and band-to-acceptor transition. The Si doping to CuGaSe2 produces two additional PL bands around 1.61 and 1.64 eV. These PL bands are attributed to the donor acceptor pair emissions due to the doped Si impurity which probably occupies Cu or Ga sites and intrinsic Cu vacancy.
机译:已经研究了通过迁移增强外延在GaAs(001)衬底上生长的未掺杂和Si掺杂的CuGaSe2单晶薄膜的光致发光(PL)特性。未掺杂层的室温PL光谱清楚地显示了与最小能带边缘和分离价带有关的自由激子发射带,但在低能区域未观察到可分辨的发射。在4.2 K时,由于价带分裂而产生的激子发射消失了。取而代之的是,两个额外的发射分别出现在1.68和1.715 eV处,这归因于受激激子和能带到受体的跃迁。掺杂到CuGaSe2的Si会在1.61和1.64 eV附近产生两个额外的PL带。由于掺杂的Si杂质可能占据Cu或Ga位点和固有的Cu空位,所以这些PL带归因于给体受体对发射。

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  • 来源
    《Applied Physics》 |2013年第2期|257-261|共5页
  • 作者单位

    School of Science and Engineering, Waseda University, 3-4-1,Okubo, Shinjuku, Tokyo 169-8555, Japan;

    School of Science and Engineering, Waseda University, 3-4-1,Okubo, Shinjuku, Tokyo 169-8555, Japan,CREST, JST, 4-1-8, Honcho Kawaguchi, Saitama, 332-0012,Japan;

    Waseda Institute for Advanced Study, Waseda University, 1-6-1,Nishiwaseda, Shinjuku, Tokyo 169-8050, Japan,CREST, JST, 4-1-8, Honcho Kawaguchi, Saitama, 332-0012,Japan;

    School of Science and Engineering, Waseda University, 3-4-1,Okubo, Shinjuku, Tokyo 169-8555, Japan,CREST, JST, 4-1-8, Honcho Kawaguchi, Saitama, 332-0012,Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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