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A thin film triode type carbon nanotube field emission cathode

机译:薄膜三极管型碳纳米管场发射阴极

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摘要

The field electron emission of carbon nanotubes has been heavily studied over the past two decades for various applications, such as in display technologies, microwave amplifiers, and spacecraft propulsion. However, a commer-cializable lightweight and internally gated electron source has yet to be realized. This work presents the fabrication and testing of a novel internally gated carbon nanotube field electron emitter. Several specific methods are used to prevent electrical shorting of the gate layer, a common failure for internally gated devices. A unique design is explored where the etch pits extend into the silicon substrate and isotropic etching is used to create a lateral buffer zone between the gate and carbon nanotubes. Carbon nanotubes are self-aligned to and within 10 microns from the gate, which creates large electric fields at low potential inputs. Initial tests confirm high field emission performance with an anode current density (based on total area of the device) of 293 μA cm~(-2) and a gate current density of 1.68 mA cm~(-2) at 250 V.
机译:在过去的二十年中,对碳纳米管的场电子发射进行了广泛的研究,以用于各种应用,例如显示技术,微波放大器和航天器推进。然而,尚未实现可商业化的轻量级和内部选通的电子源。这项工作提出了一种新型的内部门控碳纳米管场电子发射器的制造和测试。使用几种特定的方法来防止栅极层发生电短路,这是内部栅极器件的常见故障。探索了一种独特的设计,其中蚀刻坑延伸到硅衬底中,并且各向同性蚀刻用于在栅极和碳纳米管之间创建横向缓冲区。碳纳米管是自对准的,且距栅极10微米以内,这会在低电势输入处产生大电场。初步测试证实了高场发射性能,在250 V时阳极电流密度(基于器件的总面积)为293μAcm〜(-2),栅极电流密度为1.68 mA cm〜(-2)。

著录项

  • 来源
    《Applied Physics 》 |2013年第1期| 99-104| 共6页
  • 作者单位

    Electro-Optical Systems Laboratory, Georgia Tech Research Institute, 925 Dalney St., Atlanta,GA 30332, USA,School of Materials Science and Engineering, Georgia Institute of Technology, 225 North Ave., Atlanta, GA 30332, USA;

    Electro-Optical Systems Laboratory, Georgia Tech Research Institute, 925 Dalney St., Atlanta,GA 30332, USA;

    Air Force Institute of Technology, 2950 Hobson Way, Wright-Patterson AFB, OH 45433, USA;

    Electro-Optical Systems Laboratory, Georgia Tech Research Institute, 925 Dalney St., Atlanta,GA 30332, USA,School of Materials Science and Engineering, Georgia Institute of Technology, 225 North Ave., Atlanta, GA 30332, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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