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首页> 外文期刊>Applied Physics >Doping dependence of laser-induced transverse thermoelectric voltages in the perovskite Nd_(2-x)Ce_xCuO_4 thin films
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Doping dependence of laser-induced transverse thermoelectric voltages in the perovskite Nd_(2-x)Ce_xCuO_4 thin films

机译:钙钛矿Nd_(2-x)Ce_xCuO_4薄膜中激光诱导的横向热电电压的掺杂依赖性

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摘要

Large laser-induced thermoelectric voltages (LITVs) are measured in the electron-doped Nd_(2-x)Ce_(x-) CuO_4 thin films grown on the vicinal-cut SrTiO_3 substrates by pulsed laser deposition. The dependence of LITV signals upon the doping carrier density is investigated by changing the Ce content of the films. The optimum Ce dopant corresponding to the largest voltage is found and is attributed to the two-dimensional transport behaviors of the localized electrons. The shorter laser irradiation always induces the larger voltage signals in samples with richer Ce content, suggesting the optimum dopant level is sensitive to the wavelength of excitation source. Thus, the behaviors of LITV signals are resulted from both effects of the aniso-tropic thermoelectric transport and the optical properties of the thin films. The doping dependence related with an anisotropic charge transport may come from the change in carrier density and the modification in energy band configuration.
机译:在通过脉冲激光沉积在邻近切割的SrTiO_3衬底上生长的电子掺杂Nd_(2-x)Ce_(x-)CuO_4薄膜中测量了大的激光感应热电电压(LITV)。通过改变薄膜的Ce含量来研究LITV信号对掺杂载流子密度的依赖性。找到了对应于最大电压的最佳Ce掺杂剂,并将其归因于局部电子的二维传输行为。较短的激光照射总是会在Ce含量较高的样品中感应出较大的电压信号,这表明最佳掺杂水平对激发源的波长敏感。因此,LITV信号的行为是由各向异性热电传输的影响和薄膜的光学特性共同引起的。与各向异性电荷传输有关的掺杂依赖性可能来自载流子密度的变化和能带结构的改变。

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  • 来源
    《Applied Physics》 |2015年第2期|717-723|共7页
  • 作者单位

    Research Institute of Engineering and Technology, Yunnan University, Kunming 650091, People's Republic of China,Institute of Advanced Materials for Photo-Electronics, Kunming University of Science and Technology, Kunming 650093, People's Republic of China;

    Institute of Advanced Materials for Photo-Electronics, Kunming University of Science and Technology, Kunming 650093, People's Republic of China;

    Institute of Advanced Materials for Photo-Electronics, Kunming University of Science and Technology, Kunming 650093, People's Republic of China;

    Institute of Advanced Materials for Photo-Electronics, Kunming University of Science and Technology, Kunming 650093, People's Republic of China;

    Research Institute of Engineering and Technology, Yunnan University, Kunming 650091, People's Republic of China,Institute of Advanced Materials for Photo-Electronics, Kunming University of Science and Technology, Kunming 650093, People's Republic of China;

    Institute of Advanced Materials for Photo-Electronics, Kunming University of Science and Technology, Kunming 650093, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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