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首页> 外文期刊>Applied Physics >Controlling ZnO nanowire surface density during its growth by altering morphological properties of a ZnO buffer layer by UV laser irradiation
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Controlling ZnO nanowire surface density during its growth by altering morphological properties of a ZnO buffer layer by UV laser irradiation

机译:通过UV激光照射改变ZnO缓冲层的形态学特性来控制ZnO纳米线的生长过程中的表面密度

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摘要

Zinc oxide (ZnO) nanocrystals, which are characterized by their configurations and fine structures, are unique oxide semiconductors. In this report, it is demonstrated that the number density of ZnO nanowires can be controlled by proper treatments of the buffer layer with ultraviolet laser irradiation. ZnO nanowires were synthesized on the locally laser-irradiated ZnO buffer layer using nanoparticle-assisted pulsed-laser deposition (NAP-LD). The number density of ZnO nanowires decreased in the region laser-irradiated with <300 mJ/cm~2, whereas it increased in the region laser-irradiated with more than 400 mJ/cm~2. Effects of laser irradiation on ZnO buffer layers were investigated by atomic force microscopy, Kelvin probe force microscopy (KPFM), Raman spectroscopy, and X-ray diffraction analyses. In particular, the effects of laser irradiation on the surface work functions of ZnO buffer layers were investigated by KPFM, which is reported for the first time. Additionally, periodically aligned ZnO sub-microcrystals were fabricated as an application of controlling the number density of ZnO nanowires on micropatterned ZnO buffer layers using the four-beam interfered third harmonic of a Nd:YAG laser followed by NAPLD. ZnO sub-microcrystals can be used to fabricate field emitter arrays and can be developed for the application of ZnO nano/microcrystals due to their high throughput.
机译:以其构型和精细结构为特征的氧化锌(ZnO)纳米晶体是独特的氧化物半导体。在该报告中,证明了可以通过用紫外线激光照射对缓冲层进行适当的处​​理来控制ZnO纳米线的数量密度。使用纳米粒子辅助脉冲激光沉积(NAP-LD)在局部激光辐照的ZnO缓冲层上合成ZnO纳米线。 ZnO纳米线的数量密度在<300 mJ / cm〜2的激光辐照区域减小,而在大于400 mJ / cm〜2的激光辐照区域增大。通过原子力显微镜,开尔文探针力显微镜(KPFM),拉曼光谱和X射线衍射分析研究了激光辐照对ZnO缓冲层的影响。尤其是,KPFM首次研究了激光辐照对ZnO缓冲层表面功函数的影响。此外,通过使用Nd:YAG激光器的四光束干涉三次谐波和NAPLD来控制微图案化ZnO缓冲层上ZnO纳米线的数量密度,从而制造了周期性排列的ZnO亚微晶。 ZnO亚微晶可用于制造场致发射器阵列,并且由于其高通量而可开发用于ZnO纳米/微晶的应用。

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  • 来源
    《Applied Physics》 |2015年第4期|1239-1246|共8页
  • 作者单位

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

    Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka, Japan;

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

    Department of Information Science and Electrical Engineering, Kyushu University, West 2, 530-1, 744 Motooka, Nishi-ku, Fukuoka, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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