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机译:激光等离子EUV光源照射的固体产生的EUV发射
Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;
Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;
Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;
Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;
Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;
Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;
X- and gamma-ray sources; mirrors; gratings; and detectors; electron density of states and band structure of crystalline solids; X-ray emission spectra and fluorescence;
机译:激光等离子源,用于极紫外(EUV)光刻激光等离子源,用于极紫外(EUV)光刻
机译:利用EUV脉冲激发的散射或发光辐射,检测激光等离子EUV源强烈辐照引起的材料表面变化
机译:基于氙/氦气粉扑目标的激光等离子源EUV发射的空间相干测量
机译:激光等离子SXR / EUV光源:针对特定应用调整辐射参数
机译:明亮相干超快速桌面光源的开发以及EUV在软X射线吸收光谱学中的应用。
机译:FUV脉冲泵送的EUV激发的MgO发射
机译:使用软X射线和EUV激光等离子体源的纳米瘤