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EUV emission from solids illuminated with a laser-plasma EUV source

机译:激光等离子EUV光源照射的固体产生的EUV发射

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摘要

In this paper a possibility of performing fluorescence experiments in extreme ultraviolet (EUV) using a laboratory EUV source was demonstrated. Usually such measurements are performed using third-generation synchrotrons because of extremely low probability of fluorescence in this wavelength range. In this work a 10 Hz laser-plasma EUV source based on a gas puff target was used. Fluorescent radiation from Al and Si was registered. Despite relatively low spectral resolution, some differences in Si spectra coming from different kind of samples were revealed.
机译:本文证明了使用实验室EUV光源在极端紫外线(EUV)中进行荧光实验的可能性。通常使用第三代同步加速器进行此类测量,因为在此波长范围内发生荧光的可能性极低。在这项工作中,使用了基于吹气靶的10 Hz激光等离子体EUV源。记录了来自Al和Si的荧光辐射。尽管光谱分辨率相对较低,但仍显示出来自不同种类样品的Si光谱存在一些差异。

著录项

  • 来源
    《Applied physics》 |2008年第4期|737-741|共5页
  • 作者单位

    Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Street, 00-908 Warsaw, Poland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    X- and gamma-ray sources; mirrors; gratings; and detectors; electron density of states and band structure of crystalline solids; X-ray emission spectra and fluorescence;

    机译:X射线和γ射线源;镜子光栅;和探测器;态固体的电子态密度和能带结构;X射线发射光谱和荧光;

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