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Enhanced optical power and low forward voltage of GaN-based light-emitting diodes with Ga-doped ZnO transparent conducting layer

机译:具有掺杂Ga的ZnO透明导电层的GaN基发光二极管的增强的光功率和低正向电压

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Ga-doped ZnO (ZnO:Ga) films were grown by metalorganic chemical vapor deposition as transparent conducting layers for GaN light-emitting diodes (LEDs). The forward voltage of LEDs with ZnO:Ga was 3.3 V at 20 mA. The low forward voltage was attributed to the removal of a resistive ZnGa2O4 phase, decreased resistivity of ZnO:Ga films, and increased hole concentration in p-GaN by thermal annealing process. The light output power of LEDs with ZnO:Ga was increased by 25% at 20 mA compared to that of LEDs with Sn-doped indium oxide due to the enhanced transmittance and the increased hole concentration in p-GaN.
机译:通过金属有机化学气相沉积法生长了掺镓的ZnO(ZnO:Ga)薄膜,作为GaN发光二极管(LED)的透明导电层。具有ZnO:Ga的LED的正向电压在20 mA时为3.3V。低正向电压归因于通过热退火工艺去除了电阻性ZnGa2O4相,降低了ZnO:Ga膜的电阻率以及增加了p-GaN中的空穴浓度。 ZnO:Ga的LED的光输出功率在20 mA时比掺Sn的氧化铟的LED的光输出功率增加了25%,这是由于p-GaN中透射率的提高和空穴浓度的增加。

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    《Applied Physics Letters》 |2010年第5期|共页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-17 13:16:10

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