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首页> 外文期刊>Applied Physics Letters >Heavy p-type doping of ZnSe thin films using Cu2Se in pulsed laser deposition
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Heavy p-type doping of ZnSe thin films using Cu2Se in pulsed laser deposition

机译:在脉冲激光沉积中使用Cu2Se重掺杂ZnSe薄膜的p型

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Undoped, Cu-doped, Se-enriched, and Cu2Se-doped ZnSe films have been grown on fused quartz substrates by pulsed laser deposition. While the other films are highly resistive, Cu2Se-doped ZnSe films are p-type conducting with hole concentrations of ∼1.1 × 1019 cm-3 and resistivities of ∼0.098 Ω cm (compared with previous reports of ∼1×1018 cm-3 and ∼0.75 Ω cm). The exceptional heavy p-type doping of ZnSe films can be attributed to substitution of Zn atoms with Cu while limiting selenium-vacancy-associated compensating defects with additional selenium. This work is of importance to solve doping difficulties and contact problems of wide-bandgap semiconductors.
机译:通过脉冲激光沉积法在熔融石英衬底上生长了未掺杂,掺杂Cu,富硒和掺杂Cu2Se的ZnSe薄膜。其他薄膜具有高电阻性,掺杂Cu2Se的ZnSe薄膜为p型导电,空穴浓度为〜1.1×10 19 cm -3 ,电阻率约为0.098Ω厘米(与先前报道的〜1×10 18 cm -3 和〜0.75Ωcm相比)。 ZnSe膜的异常重p型掺杂可以归因于用Cu取代Zn原子,同时用额外的硒限制了与硒空位相关的补偿缺陷。这项工作对于解决宽带隙半导体的掺杂困难和接触问题非常重要。

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