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首页> 外文期刊>Applied Physics Letters >Shift of responsive peak in GaN-based metal-insulator-semiconductor photodetectors
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Shift of responsive peak in GaN-based metal-insulator-semiconductor photodetectors

机译:GaN基金属-绝缘体-半导体光电探测器中响应峰的移动

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摘要

A gallium nitride (GaN)-based metal-insulator-semiconductor (MIS) ultraviolet photodetector (PD) was fabricated on a sapphire substrate. It was found that the responsive peak of the GaN-based MIS PD redshifted with increasing negative bias, which has not been reported before. Also, the shift of the responsive peak has been interpreted in terms of the tunneling procedure of the photo-generated holes assisted by defects in the interfaces between the GaN layers and the SiNx layers.
机译:在蓝宝石衬底上制造了基于氮化镓(GaN)的金属绝缘体半导体(MIS)紫外线光电探测器(PD)。已经发现,基于GaN的MIS PD的响应峰随着负偏压的增加而发生红移,这以前没有报道。而且,响应峰的移动已经根据GaN层与SiNx层之间的界面中的缺陷辅助的光生空穴的隧穿过程进行了解释。

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