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Modeling of high composition AlGaN channel high electron mobility transistors with large threshold voltage

机译:具有高阈值电压的高成分AlGaN沟道高电子迁移率晶体管的建模

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We report on the potential of high electron mobility transistors (HEMTs) consisting of high composition AlGaN channel and barrier layers for power switching applications. Detailed two-dimensional (2D) simulations show that threshold voltages in excess of 3 V can be achieved through the use of AlGaN channel layers. We also calculate the 2D electron gas mobility in AlGaN channel HEMTs and evaluate their power figures of merit as a function of device operating temperature and Al mole fraction in the channel. Our models show that power switching transistors with AlGaN channels would have comparable on-resistance to GaN-channel based transistors for the same operation voltage. The modeling in this paper shows the potential of high composition AlGaN as a channel material for future high threshold enhancement mode transistors.
机译:我们报告了由高组成的AlGaN沟道和势垒层组成的高电子迁移率晶体管(HEMT)在功率开关应用中的潜力。详细的二维(2D)模拟表明,通过使用AlGaN沟道层可以实现超过3 V的阈值电压。我们还计算了AlGaN沟道HEMT中的2D电子气迁移率,并评估了其功率因数随器件工作温度和沟道中Al摩尔分数的变化。我们的模型表明,在相同工作电压下,具有AlGaN沟道的功率开关晶体管将具有与GaN沟道晶体管相当的导通电阻。本文中的建模显示了高成分AlGaN作为未来高阈值增强模式晶体管的沟道材料的潜力。

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