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Structural and piezoelectric properties of ultra-thin SC_xAl_(1-x)N films grown on CaN by molecular beam epitaxy

机译:通过分子束外延生长的超薄SC_XAL_(1-X)N薄膜的结构和压电性能

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摘要

SC_xAl_(1-x)N(x = 0.18-0.40) thin films of ~28nm thickness grown on metal polar GaN substrates by molecular beam epitaxy are found to exhibit smooth morphology with less than 0.5 nm roughness and predominantly single-phase wurtzite crystal structure throughout the composition range. Measurement of the piezoelectric d_(33) coefficient shows a 150% increase for lattice-matched Sc_(0.18)Al_(0.82)N relative to pure aluminum nitride, whereas higher Sc contents exhibit lower piezoelectric coefficients. The electromechanical response of the epitaxial films correlates with the crystal quality and the presence of zinc blende inclusions, as observed by high-resolution electron microscopy. It is further found that the polarity of the epitaxial SC_xAl_(1-x)N layers is locked to the underlying substrate. The measured electromechanical properties of epitaxial SC_xAl_(1-x)N, their relation to the atomic crystal structure and defects, and its crystal polarity provide useful guidance toward the applications of this material.
机译:发现SC_AL_(1-x)n(x = 0.18-0.40)〜28nm厚度在金属极性GaN衬底上产生的薄膜通过分子束外延被发现表现出光滑的形态,粗糙度小于0.5nm粗糙度,主要是单相纯晶体结构在整个构成范围内。压电D_(33)系数的测量表明,相对于纯氮化铝的晶格匹配SC_(0.18)AL_(0.82)N增加150%,而较高的SC内容物表现出较低的压电系数。如高分辨率电子显微镜观察到的,外延膜的机电响应与晶体质量和锌混合夹杂物的存在相关。进一步发现,外延SC_AL_(1-x)n层的极性被锁定到下面的基板。外延Sc_α(1-x)n的测量机电性能,它们与原子晶体结构和缺陷的关系,其晶体极性对该材料的应用提供了有用的指导。

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  • 来源
    《Applied Physics Letters》 |2020年第11期|112101.1-112101.6|共6页
  • 作者单位

    Department of Materials Science and Engineering Cornell University Ithaca New York 14853 USA;

    Department of Physics Cornell University Ithaca New York 14853 USA School of Applied and Engineering Physics Cornell University Ithaca New York 14853 USA;

    School of Applied and Engineering Physics Cornell University Ithaca New York 14853 USA;

    Department of Materials Science and Engineering Cornell University Ithaca New York 14853 USA;

    School of Applied and Engineering Physics Cornell University Ithaca New York 14853 USA Kavli Institute at Cornell for Nanoscale Science Cornell University Ithaca New York 14853 USA;

    Department of Materials Science and Engineering Cornell University Ithaca New York 14853 USA Kavli Institute at Cornell for Nanoscale Science Cornell University Ithaca New York 14853 USA School of Electrical and Computer Engineering Cornell University Ithaca New York 14853 USA;

    Department of Materials Science and Engineering Cornell University Ithaca New York 14853 USA Kavli Institute at Cornell for Nanoscale Science Cornell University Ithaca New York 14853 USA School of Electrical and Computer Engineering Cornell University Ithaca New York 14853 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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