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Anti-Klein tunneling in topoelectrical Weyl semimetal circuits

机译:拓扑Weyl半金属电路中的反克莱因隧道效应

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摘要

Topoelectrical (TE) circuits consisting of capacitors and inductors can be designed to exhibit various Weyl semimetal (WSM) phases in their admittance dispersion. We consider a TE heterojunction circuit consisting of a central region sandwiched by source and drain regions. The energy flux transmission across the heterojunction can be tuned to exhibit perfect transmission near normal incidence (Klein tunneling) for one valley and perfect reflection (anti-Klein tunneling) for the other valley by controlling the WSM phases of the heterojunction. Perfect valley-polarized transmission occurs when the dispersion tilt to Fermi velocity ratio in the source region is reciprocal to that in the central barrier region. This unusual flux transmission is ascribed to two factors, i.e., perfect pseudospin (sublattice) polarization at normal incidence and complete decoupling of one of the sublattice polarizations at the critical velocity ratio. The emergence of anti-Klein tunneling by design in TE circuits suggests a possible realization of the effect in real WSM materials.
机译:可以设计由电容器和电感器组成的拓扑(TE)电路,以在其导纳扩散中展现出各种Weyl半金属(WSM)相。我们考虑一个TE异质结电路,该电路由被源极区和漏极区夹在中间的中心区组成。通过控制异质结的WSM相,可以调整跨异质结的能量通量传输,使其在一个波谷处表现出接近法向入射的完美传输(克莱因隧穿),而在另一个波谷处表现出完美的反射(反克莱因隧穿)。当源区中的色散倾斜度与费米速度比与中心势垒区中的色散倾角与费米速度之比成正比时,就会发生完美的谷极化传输。这种异常的通量传输归因于两个因素,即,在法向入射时的完美伪自旋(亚晶格)极化和在临界速度比下的亚晶格极化之一完全解耦。通过在TE电路中进行设计,可以防止反克莱因隧道效应的出现,这表明可能在实际的WSM材料中实现这种效果。

著录项

  • 来源
    《Applied Physics Letters》 |2020年第11期|111904.1-111904.5|共5页
  • 作者单位

    Department of Electrical and Computer Engineering National University of Singapore Singapore 117583;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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