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InAsSb-based heterostructures for infrared light modulation

机译:基于InAsSb的异质结构用于红外光调制

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We demonstrate the strong modulation of the long wave infrared transmission of GaInSb/InAsSb/AlInAsSb heterostructures under carrier injection. This results in the population of states in the conduction band of the narrow-gap layer and changes the absorption and refractive index over a broad wavelength range. At lambda = 8.6-mu m, a single-pass intensity modulation depth up to 9% was demonstrated at T = 77K for a 1-mu m-thick InAs0.58Sb0.42 absorber. By modeling the structure, we show that this corresponds to the electron quasi-Fermi level rising up to 30meV above the conduction band edge. Due to the strong band-to-band absorption, the change in the quasi-Fermi level is accompanied by a modulation of the refractive index by up to 0.06 in the spectral range below the energy gap of the alloy. This change is orders of magnitude greater than what is achievable in conventional electro-optic materials and allows, for example, the external intensity modulation of long-wave infrared laser sources with a high extinction ratio and a nanosecond-scale time response. Low power requirements make it possible to develop arrays of integrated devices for optical beam steering and shaping.
机译:我们展示了在载流子注入下GaInSb / InAsSb / AlInAsSb异质结构的长波红外传输的强调制。这导致在窄带隙层的导带中存在大量的状态,并在很宽的波长范围内改变吸收率和折射率。在λ= 8.6μm的情况下,对于厚度为1μm的InAs0.58Sb0.42吸收体,在T = 77K时,单程强度调制深度达到了9%。通过对结构进行建模,我们表明这与电子准费米能级相对应,其在导带边缘以上上升至30meV。由于强的带间吸收,准费米能级的变化在合金能隙以下的光谱范围内伴随着高达0.06的折射率调制。该变化比常规电光材料中可获得的变化大几个数量级,并且例如允许具有高消光比和纳秒级时间响应的长波红外激光源的外部强度调制。低功率要求使开发用于光束转向和整形的集成设备阵列成为可能。

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