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Increase in the piezoelectric response of scandium-doped gallium nitride thin films sputtered using a metal interlayer for piezo MEMS

机译:使用用于压电MEMS的金属夹层溅射的掺杂scan的氮化镓薄膜的压电响应增加

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摘要

Wurtzite gallium nitride (GaN) has a polarity along the c-axis and piezoelectric properties the same as aluminum nitride. Since it has a high mechanical quality factor and high output sensitivity, it is expected to perform well in piezo micro-electro-mechanical system devices. This paper demonstrates that Elf and Mo interlayers enable the preparation of highly (001)-oriented GaN films via conventional sputtering at a low temperature (400 degrees C). The piezoelectric coefficient d(33) of the prepared undoped GaN films is equivalent to that of a single-crystal GaN. Furthermore, the results demonstrate that the piezoelectric response of GaN films increases significantly when they are doped with scandium (Sc). Although this enhancement was predicted theoretically, the piezoelectric response of Sc-doped GaN films prepared on I If and Mo interlayers has shown great improvement. Moreover, bulk acoustic wave resonators constructed using Sc-doped GaN films show a piezoelectric coupling factor that is three times larger than that of a single-crystal GaN. Published, under license by AIP Publishing.
机译:纤锌矿型氮化镓(GaN)的c轴极性和压电特性与氮化铝相同。由于它具有较高的机械品质因数和较高的输出灵敏​​度,因此有望在压电微机电系统器件中发挥良好的性能。本文证明了Elf和Mo中间层能够在低温(400摄氏度)下通过常规溅射制备高度(001)取向的GaN膜。所制备的未掺杂的GaN膜的压电系数d(33)等于单晶GaN的压电系数。此外,结果表明,当GaN膜掺杂scan(Sc)时,其压电响应会显着增加。尽管从理论上预测了这种增强,但是在IIf和Mo中间层上制备的掺杂Sc的GaN薄膜的压电响应已显示出很大的改善。此外,使用掺杂有Sc的GaN膜构成的体声波谐振器的压电耦合系数比单晶GaN的压电耦合系数大三倍。经AIP Publishing授权出版。

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  • 来源
    《Applied Physics Letters》 |2019年第1期|012902.1-012902.5|共5页
  • 作者单位

    Natl Inst Adv Ind Sci & Technol, Adv Mfg Res Inst, 807-1 Shuku Machi, Tosu, Saga 8410052, Japan|Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Dept Mol & Mat Sci, 6-1 Kasugakoen, Kasuga, Fukuoka 8168580, Japan;

    Murata Mfg Co Ltd, 1-10-1 Higashikotari, Kyoto 6178555, Japan;

    Murata Mfg Co Ltd, 1-10-1 Higashikotari, Kyoto 6178555, Japan;

    Natl Inst Adv Ind Sci & Technol, Adv Mfg Res Inst, 807-1 Shuku Machi, Tosu, Saga 8410052, Japan|Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Dept Mol & Mat Sci, 6-1 Kasugakoen, Kasuga, Fukuoka 8168580, Japan;

    Murata Mfg Co Ltd, 1-10-1 Higashikotari, Kyoto 6178555, Japan;

    Natl Inst Adv Ind Sci & Technol, Adv Mfg Res Inst, 807-1 Shuku Machi, Tosu, Saga 8410052, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 04:09:29

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