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Epitaxial thin film growth of Ca_(2)RuO_(4+δ) by pulsed laser deposition

机译:Ca_(2)RuO_(4 +δ)的外延薄膜生长

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摘要

Epitaxial Ca_(2)RuO_(4+δ) thin films have been grown on (001) LaAlO_(3) substrate by pulsed laser deposition. X-ray diffraction and transmission electron microscopy studies show that the films are single crystal with good structural quality. The films are determined to have quasitetragonal structure with a=5.352(8) A, c=12.20(9) A and epitaxially grown on the substrate with in-plane tensile strains. C plane of the film is parallel to the substrate surface and its <100> is along <110> of the pseudocubic LaAlO_(3) cell. Resistivity versus temperature measurement reveals that the thin film has metallic-like behavior with low resistivity (<0.002 Ω cm) and no metal-to-insulator transition between 2 and 300 K, different from its bulk material property.
机译:通过脉冲激光沉积在(001)LaAlO_(3)衬底上生长了外延Ca_(2)RuO_(4 +δ)薄膜。 X射线衍射和透射电子显微镜研究表明,这些膜是具有良好结构质量的单晶。确定该膜具有a = 5.352(8)A,c = 12.20(9)A的准四边形结构,并以面内拉伸应变在衬底上外延生长。膜的C平面平行于基板表面,并且其<100>沿着伪立方LaAlO_(3)单元的<110>。电阻率与温度的关系表明,该薄膜具有类似金属的特性,具有低电阻率(<0.002Ωcm),并且在2至300 K之间没有金属到绝缘体的转变,这与其块状材料的特性不同。

著录项

  • 来源
    《Applied Physics Letters》 |2004年第25期|p.6146-6148|共3页
  • 作者单位

    Department of Electrical and Computer Engineering, Florida A&M University and Florida State University, Tallahassee, Florida 32310;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

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