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Microwave characterization of (Pb, La)TiO_(3) thin films integrated on ZrO_(2)/SiO_(2)/Si wafers by sol-gel techniques

机译:溶胶-凝胶技术表征ZrO_(2)/ SiO_(2)/ Si晶片上集成的(Pb,La)TiO_(3)薄膜的微波特性

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摘要

Polycrystalline perovskite lead lanthanum titanate (PLT) thin films were prepared by a sol-gel method on ZrO_(2)/SiO_(2)/Si substrates. The structure of the films was studied by x-ray diffraction and scanning electron microscopy, and the microwave dielectric properties characterized on a network analyzer. A strong dependence of the dielectric constant of PLT films and, correspondingly, the resonance frequency of PLT-based interdigital capacitor on the sample preparation conditions were observed. They resulted from the structural transformation of PLT from a layered structure to a uniform film as the annealing temperature was raised from 550 to 700℃, suggesting a possible way to modify the device performance by controlling the layered structure of the ferroelectric film.
机译:通过溶胶-凝胶法在ZrO_(2)/ SiO_(2)/ Si衬底上制备了多晶钙钛矿钛酸镧铅(PLT)薄膜。通过X射线衍射和扫描电子显微镜研究了膜的结构,并在网络分析仪上表征了微波介电性能。观察到PLT薄膜的介电常数以及相应的PLT型叉指电容器的谐振频率与样品制备条件的强烈相关性。它们是由于随着退火温度从550升高到700℃,PLT从层状结构转变为均匀的膜而产生的,这表明通过控制铁电膜的层状结构来改变器件性能的一种可能方法。

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