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Microstructure and properties of single crystal BaTiO_(3) thin films synthesized by ion implantation-induced layer transfer

机译:离子注入诱导层转移合成BaTiO_(3)单晶薄膜的微观结构和性能

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摘要

Single crystal BaTiO_(3) thin films have been transferred onto Pt-coated and Si_(3)N_(4)-coated substrates by the ion implantation-induced layer transfer method using H~(+) and He~(+) ion coimplantation and subsequent annealing. The transferred BaTiO_(3) films are single crystalline with root mean square roughness of 17 nm. Polarized optical and piezoresponse force microscopy (PFM) indicate that the BaTiO_(3) film domain structure closely resembles that of bulk tetragonal BaTiO_(3) and atomic force microscopy shows a 90° a-c domain structure with a tetragonal angle of 0.5°-0.6°. Micro-Raman spectroscopy indicates that the local mode intensity is degraded in implanted BaTiO_(3) but recovers during anneals above the Curie temperature. The piezoelectric coefficient, d_(33), is estimated from PFM to be 80-100 pm/V and the coercive electric field (E_(c)) is 12-20 kV/cm, comparable to those in single crystal BaTiO_(3).
机译:通过使用H〜(+)和He〜(+)离子共注入的离子注入诱导层转移方法,将单晶BaTiO_(3)薄膜转移到Pt涂层和Si_(3)N_(4)涂层的衬底上然后进行退火。转移的BaTiO_(3)薄膜为单晶,均方根粗糙度为17 nm。偏光和压电响应力显微镜(PFM)表明BaTiO_(3)的薄膜畴结构与块状四方BaTiO_(3)的结构非常相似,原子力显微镜显示90°ac畴结构,四边形角为0.5°-0.6° 。显微拉曼光谱表明,在注入的BaTiO_(3)中,局部模式强度降低,但在居里温度以上的退火过程中恢复。压电系数d_(33)由PFM估算为80-100 pm / V,矫顽电场(E_(c))为12-20 kV / cm,与单晶BaTiO_(3)相当。

著录项

  • 来源
    《Applied Physics Letters》 |2004年第3期|p.455-457|共3页
  • 作者单位

    Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, California 91125;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

  • 入库时间 2022-08-18 03:23:20

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