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Effect of operating temperature and film thickness on the pyroelectric response of ferroelectric materials

机译:工作温度和膜厚对铁电材料热电响应的影响

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摘要

The influence of the operating temperature and film thickness on the pyroelectric properties of (001) Ba_(0.6)Sr_(0.4)TiO_(3) (BST 60/40) epitaxial films on (001) LaAlO_(3), MgO, and Si substrates is investigated theoretically via a thermodynamic model. The results are presented using contour maps that can be used to identify "design windows" for film thickness and operating temperature for optimum pyroelectric response. For BST 60/40 on LAO and MgO large pyroelectric coefficients (~0.7 μC cm~(-2) K~(-1)) are observed at near room temperature for moderate film thickness (50-200 nm). The pyroresponse of films on Si is suppressed by two orders of magnitude compared to bulk BST 60/40 due to internal stresses. Significant recovery in the pyroelectric coefficient on Si is expected for lower growth temperatures due to the reduction of thermal stresses.
机译:工作温度和膜厚对(001)LaAlO_(3),MgO和Si上(001)Ba_(0.6)Sr_(0.4)TiO_(3)(BST 60/40)外延膜热释电性能的影响理论上通过热力学模型研究基材。使用等高线图显示结果,该等高线图可用于识别膜厚度和最佳热电响应的工作温度的“设计窗口”。对于LAO和MgO上的BST 60/40,在接近室温的中等膜厚(50-200 nm)处观察到大的热电系数(〜0.7μCcm〜(-2)K〜(-1))。由于内部应力,与块状BST 60/40相比,Si上的薄膜的热响应被抑制了两个数量级。由于降低了热应力,对于较低的生长温度,预计硅上的热电系数会显着恢复。

著录项

  • 来源
    《Applied Physics Letters》 |2004年第24期|p.4959-4961|共3页
  • 作者单位

    Department of Metallurgy and Materials Engineering, University of Connecticut, Storrs, Connecticut 06269;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

  • 入库时间 2022-08-18 03:23:19

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