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Carrier lifetime in conductive and vanadium-doped 6H-SiC substrates

机译:导电和掺杂钒的6H-SiC衬底的载流子寿命

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Conductive undoped and semi-insulating vanadium-doped 6H-SiC substrates were studied using the light-induced transient grating technique and photoluminescence (PL) spectroscopy. Carrier lifetime of 400±10 ps and diffusion coefficient of 2.7±0.2 cm~2 s~(-1) were obtained for the nominally undoped wafer, while the corresponding parameters for the V-doped wafer were estimated to be 130±5 ps and 0.9±0.5 cm~2 s~(-1) respectively. The peak PL intensity in the vanadium-doped wafers is more than three orders of magnitude lower than that in nominally undoped wafers. Low-temperature cw PL spectra revealed a band peaked at 507 nm, which is caused by V doping.
机译:使用光诱导瞬态光栅技术和光致发光(PL)光谱研究了未掺杂和半绝缘的掺杂钒的6H-SiC导电衬底。名义上未掺杂的晶片的载流子寿命为400±10 ps,扩散系数为2.7±0.2 cm〜2 s〜(-1),而掺V的晶片的相应参数估计为130±5 ps和。分别为0.9±0.5 cm〜2 s〜(-1)。掺钒晶片中的峰值PL强度比标称未掺杂晶片中的峰值PL强度低三个多数量级。低温cw PL光谱显示出一个峰在507 nm处出现峰,这是由V掺杂引起的。

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