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High mobility two-dimensional electron gas in AlGaN/GaN heterostructures grown on bulk GaN by plasma assisted molecular beam epitaxy

机译:等离子体辅助分子束外延在块状GaN上生长的AlGaN / GaN异质结构中的高迁移率二维电子气

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摘要

The results on growth and magnetotransport characterization of AlGaN/GaN heterostructures obtained by plasma assisted molecular beam epitaxy on dislocation-free (below 100 cm~(-2)) GaN high pressure synthesized bulk substrates are presented. The record mobilities of the two dimensional electron gas (2DEG) exceeding 100000 cm~2/Vs at liquid helium temperature and 2 500 cm~2/V s at room temperature are reported. An analysis of the high field conductivity tensor components allowed us to discuss the main electron scattering mechanisms and to confirm unambiguously the 2DEG room temperature mobility values.
机译:提出了在无位错(低于100 cm〜(-2)以下)GaN高压合成体衬底上进行等离子体辅助分子束外延生长的AlGaN / GaN异质结构的生长和磁输运表征的结果。据报道,在液氦温度下,二维电子气(2DEG)的迁移率超过了100000 cm〜2 / Vs,在室温下,迁移率达到了2500 cm〜2 / Vs。对高场电导率张量分量的分析使我们能够讨论主要的电子散射机理,并明确确定2DEG室温迁移率值。

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