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GaSb quantum-well-based 'buffer-free' vertical light emitting diode monolithically embedded within a GaAs cavity incorporating interfacial misfit arrays

机译:GaSb基于量子阱的“无缓冲”垂直发光二极管,单片嵌入包含界面失配阵列的GaAs腔内

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摘要

The authors demonstrate a monolithic, electrically injected, vertically emitting GaSb/AlGaSb light emitting diode (LED) emitting at 1.6 μm comprised of a hybrid GaAs/GaSb-based structure. The LED is comprised of a GaSb/AlGaSb quantum well/barrier active region embedded within high index contrast GaAs/AlGaAs distributed Bragg reflectors (DBRs) using two interfacial misfit (IMF) arrays to relieve the strain induced from the high 8% lattice mismatch between the material systems. The first IMF is formed under compressive strain conditions to enable strain-free, defect-free deposition of GaSb active region directly on the lower GaAs/AlAs DBRs without need for thick buffer. The second IMF is formed under tensile conditions to enable the upper GaAs/AlAs DBRs on the GaSb active region. The device demonstrates a maximum output power of 3.5 μW. Initial diode optical and electrical characteristics along with IMF band structure are discussed.
机译:作者展示了一个整体的,电注入的,垂直发射的GaSb / AlGaSb发光二极管(LED),其发射功率为1.6μm,由基于GaAs / GaSb的混合结构组成。该LED包含一个GaSb / AlGaSb量子阱/势垒有源区,该有源区嵌入在高折射率对比度的GaAs / AlGaAs分布式布拉格反射器(DBR)中,使用两个界面失配(IMF)阵列来缓解因高8%晶格失配引起的应变材料系统。第一IMF是在压缩应变条件下形成的,以实现无应变,无缺陷的GaSb有源区直接沉积在较低的GaAs / AlAs DBR上,而无需厚缓冲液。在拉伸条件下形成第二IMF,以使GaSb有源区上的GaAs / AlAs DBR成为可能。该器件的最大输出功率为3.5μW。讨论了初始二极管的光电特性以及IMF波段结构。

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